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首页> 外文期刊>Applied Surface Science >Characterization of hydrogenated amorphous carbon thin films by end-Hall ion beam deposition
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Characterization of hydrogenated amorphous carbon thin films by end-Hall ion beam deposition

机译：霍尔霍尔离子束沉积法表征氢化非晶碳薄膜

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摘要

Pure hydrogenated amorphous carbon (a-C:H) and nitrogen doped hydrogenated amorphous carbon (α-C:H:N) thin films were prepared using end-Hall (EH) ion beam deposition with a beam energy ranging from 24 eV to 48 eV. The composition, microstructure and mechanical properties of the films were characterized by Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, scanning probe microscopy (SPM), and nano-scratch tests. The films are uniform and smooth with root mean square roughness values of 0.5-0.8 nm for α-C:H and 0.35 nm for α-C:H:N films. When the ion energy was increased from 24 eV to 48 eV, the fraction of sp~3 bonding in the α-C:H films increased from 36% to 55%, the hardness increased from 8 GPa to 12.5 GPa, and the Young's modulus increased from 100 GPa to 130 GPa. In the a-C: H :N films, N/C atomic ratio, the hardness and Young's modulus of the α-C:H:N films are, 0.087,15 and 145GPa, respectively. The results indicate that both higher ion energy and a small amount of N doping improve the mechanical properties of the films. The results have demonstrated that smooth and uniform α-C:H and α-C:H:N films with large area and reasonably high hardness and Young's modulus can be synthesized by EH ion source.
机译：使用端霍尔（EH）离子束沉积以24 eV至48 eV的束能量制备纯氢化非晶碳（a-C：H）和氮掺杂氢化非晶碳（α-C：H：N）薄膜。通过傅立叶变换红外光谱（FTIR），X射线光电子能谱（XPS），拉曼光谱，扫描探针显微镜（SPM）和纳米划痕测试对薄膜的组成，微观结构和力学性能进行了表征。所述膜均匀且光滑，对于α-C：H，均方根粗糙度值为0.5-0.8nm，对于α-C：H：N，均方根粗糙度值为0.35nm。当离子能量从24 eV增加到48 eV时，α-C：H膜中sp〜3键的比例从36％增加到55％，硬度从8 GPa增加到12.5 GPa，杨氏模量从100 GPa增加到130 GPa。在a-C：H：N薄膜中，N / C原子比，α-C：H：N薄膜的硬度和杨氏模量分别为0.087,15和145GPa。结果表明，较高的离子能量和少量的N掺杂均可改善薄膜的机械性能。结果表明，通过EH离子源可以合成出光滑，均匀的大面积α-C：H和α-C：H：N膜，具有较高的硬度和杨氏模量。

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  • 来源
    《Applied Surface Science》 |2011年第10期|p.4699-4705|共7页
  • 作者

    Y. Tang; Y.S. Li; Q Yang; A. Hirose;

  • 作者单位

    Department of Mechanical Engineering. University of Saskatchewan, 57 Campus Drive, Saskatoon SKS7N 5A9, Canada;

    Plasma Physics Laboratory, University of Saskatchewan, 116 Science Place, Saskatoon, SK S7N 5E2, Canada;

    Department of Mechanical Engineering. University of Saskatchewan, 57 Campus Drive, Saskatoon SKS7N 5A9, Canada;

    Plasma Physics Laboratory, University of Saskatchewan, 116 Science Place, Saskatoon, SK S7N 5E2, Canada;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    Amorphous carbon; End-Hall ion source; Ion beam deposition;

    机译：非晶碳霍尔离子源;离子束沉积;

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