Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films

著录项

• 来源
  《Applied Surface Science》 |2011年第17期|p.7900-7905|共6页
• 作者

  C-Y.Yen; S.-R.Jian; G.-J.Chen; C.-M.Lin; H.-Y.Lee; W.-C.Ke; Y.-Y.Liao; P.-F.Yang; C.-T.Wang; Y.-S.Lai; Jason S.-C.Jangs; J.-Y.Juang;

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• 作者单位

  Department of Materials Science and Engineering, l-Shou University, Kaohsiung 840, Taiwan;

  Department of Materials Science and Engineering, l-Shou University, Kaohsiung 840, Taiwan;

  Department of Materials Science and Engineering, l-Shou University, Kaohsiung 840, Taiwan;

  Department of Applied Science, National Hsinchu University of Education, Hsinchu 300, Taiwan;

  National Synchrotron Radiation Research Center, Hsinchu 300, Taiwan;

  Department of Mechanical Engineering, Yuan Ze University, Tao-Tuan 32003, Taiwan;

  Department of Applied Physics, National University of Kaohsiung, Kaohsiung 81148, Taiwan;

  Central Product Solutions, Advanced Semiconductor Engineering, Inc., 26 Chin 3rd Rd., Nantze Export Processing Zone, Kaohsiung 811, Taiwan;

  Central Product Solutions, Advanced Semiconductor Engineering, Inc., 26 Chin 3rd Rd., Nantze Export Processing Zone, Kaohsiung 811, Taiwan;

  Central Product Solutions, Advanced Semiconductor Engineering, Inc., 26 Chin 3rd Rd., Nantze Export Processing Zone, Kaohsiung 811, Taiwan;

  Institute of Materials Science & Engineering, National Central University, Chung-Li 320, Taiwan;

  Department of Electrophysics, National Chiao Tung University, Hsinchu 300, Taiwan;

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• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  zno thin films; atomic layer deposition; xrd; afm; nanoindentation; hardness;

  机译：锌薄膜原子层沉积;xrd;afm;纳米压痕硬度;