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首页> 外国专利> INSTALLATION FOR HIGH-TEMPERATURE VACUUM ANNEALING OF THIN FILMS WITH POSSIBILITY OF IN SITU OPTICAL OBSERVATION WITH HIGH RESOLUTION

INSTALLATION FOR HIGH-TEMPERATURE VACUUM ANNEALING OF THIN FILMS WITH POSSIBILITY OF IN SITU OPTICAL OBSERVATION WITH HIGH RESOLUTION

机译：具有高分辨率原位光学观察的薄膜高温真空退火的安装

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FIELD: microelectronics, optics, catalysis, chemical industry and other fields.;SUBSTANCE: invention relates to a device for high-temperature vacuum annealing of thin films, coatings and materials. An installation for high-temperature vacuum annealing of thin films with the possibility of in situ optical observation with high resolution contains a vacuum chamber, a heated substrate holder equipped with a block of heat shields, a vacuum pumping system, an observation window, and an optical long-focus microscope. At the same time, the installation contains a system for optical monitoring of the film surface in situ, consisting of an optical long-focus microscope, a high-resolution digital camera, an illumination system, a quartz viewing window with a diameter of 140 mm and a system for recording and processing images, a thermal protection system consisting of a water cooling system, thermal a shutter screen located above the substrate holder, an automatic system for monitoring and maintaining the set temperature parameters of the installation, and the vacuum chamber is equipped with a water-cooled circuit, as well as a fitting for supplying a buffer gas, a system of interlocks and protection with alarm states in OwenCloud. The vacuum pumping system consists of a membrane backing pump, a turbomolecular high-vacuum pump and a vacuum line, a heated substrate holder with a diameter of 90 mm is made of stainless steel and consists of a tubular electric heater filled with a hermetic heat-conducting compound, a copper disk, a block of heat shields and thermal insulation.;EFFECT: invention increases reliability of the installation for high-temperature vacuum annealing of thin films, and provides the possibility of simultaneous implementation of high-vacuum high-temperature annealing and in situ observation of the morphology and structure of films during annealing.;3 cl, 3 dwg
机译：领域：微电子，光学，催化，化学工业和其他领域。物质：发明涉及薄膜，涂层和材料的高温真空退火装置。具有高分辨率原位光学观察的薄膜的高温真空退火的装置包含真空室，一种配备有热屏蔽块，真空泵系统，观察窗口的加热基板支架，以及光学长聚焦显微镜。同时，该装置包含用于光学监测的系统，原位由光学长聚焦显微镜，高分辨率数码相机，照明系统，直径为140 mm的石英观察窗口组成。和一个用于记录和处理图像的系统，由水冷系统组成的热保护系统，热屏幕位于基板支架上方的快门屏幕，用于监控和维护安装的设定温度参数的自动系统，以及真空室配备水冷电路，以及供应缓冲气体的配件，欧伦克州的报警态有互锁和保护系统。真空泵系统由膜背泵，涡轮分子高真空泵和真空管线组成，具有直径为90毫米的加热基板支架，由不锈钢制成，由填充具有密封热的管状电加热器组成 - 导电化合物，铜盘，隔热罩和隔热块。;效果：发明提高了薄膜的高温真空退火装置的可靠性，并提供了高真空高温退火的同时实现的可能性并且原位观察退火过程中薄膜的形态和结构。; 3 cl，3 dwg

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