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首页> 外文期刊>Applied Surface Science >Inhomogeneous Optoelectronic And Microstructure Property Distribution Across The Substrate Of Zno:Al Films Deposited By Room Temperature Magnetron Sputtering
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Inhomogeneous Optoelectronic And Microstructure Property Distribution Across The Substrate Of Zno:Al Films Deposited By Room Temperature Magnetron Sputtering

机译：室温磁控溅射沉积Zno：Al薄膜在整个衬底上的非均匀光电和微观结构特性分布

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摘要

Aluminum doped zinc oxide (ZAO) films were deposited by direct current (DC) reactive magnetron sputtering from a ZnO:Al_2O_3(3wt.% AI_2O_3) ceramic target at room temperature. In order to explore the inhomogeneous property distribution across the substrate, the films were deposited with varied substrate-target distances (D_s) ranging from 2 cm to 9 cm. The experimental results obtained from four-point probe, spectrophotometer, scanning electron microscope, X-ray diffractometer and Auger electronic spectrometer were analyzed to explore the nonuniform property distribution of the obtained ZAO films. The results confirmed that the films' optoelectronic properties, crystallinity and surface morphology, etc., which were obtained from different substrate areas facing the target were remarkably different. It was revealed that the inhomogeneous property distribution was noticeably dependent on the Ds. It was also suggested that the great difference of electrical conductivity among films from different substrate areas could not be ascribed to the difference of chemical composition, but might be explained by the distinctive crystallinity correspondingly. Films from different substrate regions with distinctive electrical characteristics were either (002) or (11 0) textured.
机译：在室温下，通过直流（DC）反应磁控溅射从ZnO：Al_2O_3（3wt。％AI_2O_3）陶瓷靶沉积铝掺杂的氧化锌（ZAO）膜。为了探究整个基板上的不均匀特性分布，以2到9厘米不等的基板目标距离（D_s）沉积薄膜。分析了由四点探针，分光光度计，扫描电子显微镜，X射线衍射仪和俄歇电子能谱仪获得的实验结果，以探索所得ZAO膜的不均匀性能分布。结果证实，从面对靶的不同衬底区域获得的膜的光电性能，结晶度和表面形态等显着不同。结果表明，不均匀的性能分布明显取决于Ds。也有人认为，来自不同基材区域的薄膜之间电导率的巨大差异不能归因于化学成分的差异，而是可以通过独特的结晶度来解释。对具有不同电特性的不同基材区域的膜进行（002）或（11 0）织构化处理。

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  • 来源
    《Applied Surface Science》 |2011年第23期|p.9773-9779|共7页
  • 作者

    Tao Wang; Xungang Diao; Xuan Wang;

  • 作者单位

    School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, China;

    School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, China;

    School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, China;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    ZAO film; Magnetron sputtering; Inhomogeneous distribution;

    机译：ZAO膜;磁控溅射;不均匀分布;

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