机译:退火对(311)B GaAsBi层的结构和光学性质的影响
Departamento de Ciencia de los Materiales e I.M.y Q. I., Facultad de Ciencias, Universidad de Cadiz, 11510 Puerto Real, Cadiz, Spain;
rnDepartamento de Ciencia de los Materiales e I.M.y Q. I., Facultad de Ciencias, Universidad de Cadiz, 11510 Puerto Real, Cadiz, Spain;
rnSchool of Physics and Astronomy, University of Nottingham, NG7 2RD Nottingham, United Kingdom;
rnSchool of Physics and Astronomy, University of Nottingham, NG7 2RD Nottingham, United Kingdom Nottingham Nanotechnology &Nanoscience Centre, University of Nottingham, NG7 2RD Nottingham, United Kingdom;
rnSchool of Physics and Astronomy, University of Nottingham, NG7 2RD Nottingham, United Kingdom;
rnSchool of Physics and Astronomy, University of Nottingham, NG7 2RD Nottingham, United Kingdom;
rnDepartamento de Ciencia de los Materiales e I.M.y Q. I., Facultad de Ciencias, Universidad de Cadiz, 11510 Puerto Real, Cadiz, Spain;
semiconductor compounds; GaAsBi; transmission electron microscopy; molecular beam epitaxy; photoluminescence;
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