机译:反应性脉冲直流不平衡磁控溅射制备的TiAlSiN纳米复合涂层的沉积与表征
Surface Engineering Division, National Aerospace Laboratories (CSIR), Post Bag No. 1779, Bangalore 560 017, India;
rnSurface Engineering Division, National Aerospace Laboratories (CSIR), Post Bag No. 1779, Bangalore 560 017, India;
rnSurface Engineering Division, National Aerospace Laboratories (CSIR), Post Bag No. 1779, Bangalore 560 017, India;
rnSurface Engineering Division, National Aerospace Laboratories (CSIR), Post Bag No. 1779, Bangalore 560 017, India;
rnSurface Engineering Division, National Aerospace Laboratories (CSIR), Post Bag No. 1779, Bangalore 560 017, India;
TiAlSiN nanocomposite coatings; structure and properties; reactive magnetron sputtering; performance evaluation;
机译:反应性直流不平衡磁控溅射制备TiAlN / Si3N4超硬纳米复合涂层的沉积与表征
机译:脉冲直流无功磁控溅射法制备氮化铝涂层的生长与表征
机译:脉冲直流无功磁控溅射法制备氧化铬涂层的生长与表征
机译:高功率脉冲磁控溅射蚀刻不平衡磁控溅射沉积(HIPIMS / UBM)工艺沉积的工业化生产耐腐蚀CrN / NbN涂层
机译:脉冲反应直流磁控溅射技术制备的高介电常数薄膜的沉积和表征。
机译:直流反应磁控溅射制备纳米结构多孔ZnO薄膜的表面性能
机译:直流磁控溅射和大功率脉冲磁控溅射在碳化硼涂层上的低温生长