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首页> 外文期刊>Applied Surface Science >Effect of sputtering parameters on surface morphology and catalytic efficiency of thin platinum films
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Effect of sputtering parameters on surface morphology and catalytic efficiency of thin platinum films

机译：溅射参数对铂薄膜表面形貌和催化效率的影响

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摘要

This paper presents a research on the influence of sputtering parameters (dc power, argon pressure) and film thickness/metal loading on the surface structure and morphology of platinum thin films and their catalytic activity toward the oxygen reduction in acid aqueous solutions. The properties of the sputtered films were studied using scanning electron microscopy (SEM), X-ray diffraction (XRD), and the electrochemical methods of cyclic voltammetry and steady state polarisation. It was found that low sputtering power and high sputtering pressure lead to deposition of mechanically stable crystalline Pt films with extended surface area. Optimal sputtering parameters of 68 mTorr argon pressure and 100 W dc power were determined. The films deposited at these conditions possess homogeneous, highly developed surface with columnar structure. The increase in thickness results in essential epitaxial growth of the platinum particles with distinct [111] orientation. The best utilization of the catalyst (1.10~(-3) A cm~(-2) nm_(pt)~(-1) mass activity determined from the polarisation curves at 0.4 V) was achieved at 120-130 nm film thickness.
机译：本文研究了溅射参数（直流功率，氩气压力）和膜厚/金属负载对铂薄膜表面结构和形貌及其对酸性水溶液中氧还原的催化活性的影响。使用扫描电子显微镜（SEM），X射线衍射（XRD）以及循环伏安法和稳态极化的电化学方法研究了溅射薄膜的性能。发现低溅射功率和高溅射压力导致具有扩大的表面积的机械稳定的晶体Pt膜的沉积。确定了68 mTorr氩气压力和100 W dc功率的最佳溅射参数。在这些条件下沉积的膜具有均匀，高度显影的具有柱状结构的表面。厚度的增加导致具有明显的[111]取向的铂颗粒的基本外延生长。在120-130 nm的膜厚下，催化剂的最佳利用率（1.10〜（-3）cm〜（-2）nm_（pt）〜（-1）的质量活度由0.4 V的极化曲线确定）。

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  • 来源
    《Applied Surface Science》 |2009年第14期|6479-6486|共8页
  • 作者

    E. Slavcheva; G. Ganske; G. Topalov; W. Mokwa; U. Schnakenberg;

  • 作者单位

    Institute of Materials in Electrical Engineering I, RWTH, Aachen University, 52074 Aachen, Germany Institute of Electrochemistry and Energy Systems, Bulgarian Academy of Sciences, G. Bonchev Street 10,1113 Sofia, Bulgaria;

    Institute of Materials in Electrical Engineering I, RWTH, Aachen University, 52074 Aachen, Germany;

    Institute of Electrochemistry and Energy Systems, Bulgarian Academy of Sciences, 1113 Sofia, Bulgaria;

    Institute of Materials in Electrical Engineering I, RWTH, Aachen University, 52074 Aachen, Germany;

    Institute of Materials in Electrical Engineering I, RWTH, Aachen University, 52074 Aachen, Germany;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    sputtered Pt films; electrocatalysis; oxygen reduction;

    机译：溅射铂膜;电催化氧气还原;

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