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首页> 外文期刊>Applied Surface Science >Structural And Optical Properties Of Nano-structured Tungsten-doped Zno Thin Films Grown By Pulsed Laser Deposition
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Structural And Optical Properties Of Nano-structured Tungsten-doped Zno Thin Films Grown By Pulsed Laser Deposition

机译：脉冲激光沉积生长的纳米钨掺杂Zno薄膜的结构和光学性质

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摘要

Novel highly c-oriented tungsten-doped zinc oxide (WZO) thin films with 1 wt% were grown by pulsed laser deposition (PLD) technique on corning 1737F glass substrate. The effects of laser energy on the structural, morphological as well as optical transmission properties of the films were studied. The films were highly transparent with average transmittance exceeding 87% in the wavelength region lying between 400 and 2500 nm. X-ray diffraction analysis (XRD) results indicated that the WZO films had c-axis preferred orientation with wurtzite structure. Film thickness and the full width at half maximum (FWHM) of the (002) peaks of the films were found to be dependent on laser fluence. The composition determined through Rutherford backscattering spectroscopy (RBS) appeared to be independent of the laser fluence. By assuming a direct band gap transition, the band gap values of 3.36,3.34 and 3.31 eV were obtained for corresponding laser fluence of 1, 1.7 and 2.7 J cm~(-2), respectively. Compared with the reported undoped ZnO band gap value of 3.37 eV, it is conjectured that the observed low band gap values obtained in this study may be attributable to tungsten incorporation in the films as well as the increase in laser fluence. The high transparency makes the films useful as optical windows while the high band gap values support the idea that the films could be good candidates for optoelectronic applications.
机译：通过脉冲激光沉积（PLD）技术在康宁1737F玻璃基板上生长了具有1 wt％的新型高度c取向的掺钨氧化锌（WZO）薄膜。研究了激光能量对薄膜的结构，形态和光学透射特性的影响。该膜是高度透明的，在400至2500nm之间的波长区域中，平均透射率超过87％。 X射线衍射分析（XRD）结果表明，WZO薄膜具有纤锌矿结构的c轴择优取向。发现膜的厚度和膜的（002）峰的半峰全宽（FWHM）取决于激光通量。通过卢瑟福背散射光谱法（RBS）确定的组成似乎与激光通量无关。通过假设直接带隙跃迁，分别对应于1、1.7和2.7 J cm〜（-2）的激光注量，获得了3.36、3.34和3.31 eV的带隙值。与报告的未掺杂的ZnO带隙值为3.37 eV相比，可以推测，在这项研究中观察到的低带隙值可能归因于薄膜中掺入了钨以及激光注量的增加。高透明性使这些膜可用作光学窗口，而高带隙值则支持该膜可能是光电应用的理想选择。

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