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Passivation of GaSb and InAs by pH-activated thioacetamide

机译:pH活化的硫代乙酰胺对GaSb和InAs的钝化

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We describe the passivation by thioacetamide (TAM) of GaSb and InAs-two Ⅲ-Ⅴ semiconductor materials important for fabricating IR devices from Type-Ⅱ superlattices (T2SLs). We use X-ray photoelectron spectroscopy (XPS) to characterize GaSb and InAs (001) surfaces treated by TAM under both acidic and basic conditions and to analyze the reoxidation of passivated surfaces over time. Both acid- and base-activated TAM treatments produce sulfide layers on GaSb and InAs. The layers produced by base-TAM appear to be of self-limited thickness <1 nm, whereas acid-TAM creates considerably thicker (1-2 nm) sulfide layers. Passivation by both acid- and base-activated TAM offers significant short-term (<1 day) protection against reoxidation, but does not prevent oxide formation after exposure to ambient air for 1-3 days. Based on this comparative study and previous literature reports, the chemical effects of TAM treatments on Ga, Sb, In, and As depend not only on the individual element and reaction conditions, but also on the compound. In other words, our results suggest that passivation chemistry for a common element in two different Ⅲ-Ⅴ materials should not, in general, be assumed to be the same.
机译:我们描述了硫代乙酰胺(TAM)对GaSb和InAs-两种Ⅲ-Ⅴ半导体材料的钝化作用,这些材料对于从Ⅱ型超晶格(T2SLs)制造IR器件很重要。我们使用X射线光电子能谱(XPS)来表征经过TAM在酸性和碱性条件下处理的GaSb和InAs(001)表面,并分析钝化表面随时间的再氧化。酸活化TAM处理和碱活化TAM处理都会在GaSb和InAs上产生硫化物层。碱-TAM产生的层似乎具有小于1 nm的自限厚度,而酸-TAM会产生相当厚的(1-2 nm)硫化物层。酸活化的TAM和碱活化的TAM均能提供显着的短期(<1天)防再氧化保护,但不能防止在暴露于环境空气中1-3天后形成氧化物。基于此比较研究和先前的文献报道,TAM处理对Ga,Sb,In和As的化学作用不仅取决于单个元素和反应条件,还取决于化合物。换句话说,我们的结果表明,通常不应该假定两种不同的Ⅲ-Ⅴ材料中一个公共元素的钝化化学是相同的。

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