The Structural And Optical Properties Of Zno/si Thin Films by Rta Treatments

S.Y. Hu; Y.C. Lee; J.W. Lee; J.C. Huang; J.L. Shen; W. Water

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The Structural And Optical Properties Of Zno/si Thin Films by Rta Treatments

机译：Rta处理的Zno / si薄膜的结构和光学性质

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ZnO/Si thin films were prepared by rf magnetron sputtering method and some of the samples were treated by rapid thermal annealing (RTA) process at different temperatures ranging from 400 to 800 ℃. The effects of RTA treatment on the structural properties were studied by using X-ray diffraction and atomic force microscopy while optical properties were studied by the photoluminescence measurements. It is observed that the ZnO film annealed at 600 ℃ reveals the strongest UV emission intensity and narrowest full width at half maximum among the temperature ranges studied. The enhanced UV emission from the film annealed at 600 ℃ is attributed to the improved crystalline quality of ZnO film due to the effective relaxation of residual compressive stress and achieving maximum grain size.

机译：采用射频磁控溅射法制备了ZnO / Si薄膜，并在400〜800℃的不同温度下对某些样品进行了快速热退火（RTA）处理。通过X射线衍射和原子力显微镜研究了RTA处理对结构性能的影响，同时通过光致发光测量研究了光学性能。观察到在600℃退火的ZnO薄膜在所研究的温度范围内显示出最强的UV发射强度和最窄的半峰全宽。 ZnO薄膜在600℃退火后，其紫外线发射增强，这归因于ZnO薄膜的结晶质量得到了改善，这是由于残余压应力的有效松弛和实现了最大晶粒尺寸。

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来源
《Applied Surface Science》 |2008年第6期|p.1578-1582|共5页
作者
S.Y. Hu; Y.C. Lee; J.W. Lee; J.C. Huang; J.L. Shen; W. Water;
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作者单位

Department of Electrical Engineering and VLSI/CAD Center, Tung Fang Institute of Technology, Hunei Township, Kaohsiung County 82941, Taiwan;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
zno thin films; rapid thermal annealing; photoluminescence;

机译：ZnO薄膜;快速热退火;光致发光;

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The Structural And Optical Properties Of Zno/si Thin Films by Rta Treatments

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