Ripple surface generated on hydrogenated amorphous carbon nitride films

Chengbing Wang; Shengrong Yang; Junyan Zhang

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Ripple surface generated on hydrogenated amorphous carbon nitride films

机译：氢化非晶氮化碳膜上产生的波纹表面

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摘要

It is reported for the first time that the periodical ripple surface feature at micrometer-scale was observed on hydrogenated amorphous carbon nitride films deposited by pulse plasma chemical vapor deposition (CVD) technique. Nitrogen incorporation to hydrogenated amorphous carbon films and the different growing environments of pulse dc plasma discharge perhaps played crucial role in the surface morphology transformation of hydrogenated amorphous carbon nitride films.

机译：首次报道了在通过脉冲等离子体化学气相沉积（CVD）技术沉积的氢化非晶碳氮化物膜上观察到微米级的周期性波纹表面特征。在氢化非晶碳膜中掺入氮和不同的脉冲直流等离子体放电生长环境可能在氢化非晶碳膜的表面形貌转变中起着至关重要的作用。

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来源
《Applied Surface Science》 |2007年第8期|p.4099-4102|共4页
作者
Chengbing Wang; Shengrong Yang; Junyan Zhang;
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作者单位

State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, PR China;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
carbon nitride films; ripple morphology;

机译：氮化碳膜;波纹形貌;

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专利

1. Effect of Annealing on the Optical and Chemical Bonding Properties of Hydrogenated Amorphous Carbon and Hydrogenated Amorphous Carbon Nitride Thin Films [J] . Richard Ritikos, Chow Chee Siong, Siti Meriam Ab. Gani, Japanese journal of applied physics . 2009,第10期

机译：退火对氢化非晶碳和氢化非晶氮化碳薄膜光学和化学键合性能的影响
2. Effects of deposition gas pressure on the properties of hydrogenated amorphous carbon nitride films grown by surface wave microwave plasma chemical vapor deposition [J] . M. Rusop, A.M.M. Omer, S. Adhikari Diamond and Related Materials . 2005,第3a7期

机译：沉积气压对表面波微波等离子体化学气相沉积法生长的氢化非晶氮化碳膜性能的影响
3. Chemical synthesis and surface morphology of amorphous hydrogenated carbon nitride film deposited by N_2/CH_4 dielectric barrier discharge plasma [J] . Abhijit Majumdar, Sadhan Chandra Das, T. Shripathi, Composite interfaces . 2012,第3a4期

机译：N_2 / CH_4介质阻挡放电等离子体沉积非晶氢化碳氮化膜的化学合成及表面形貌
4. THE ROLE OF SURFACE HYDROGEN BOND IN FRICTION BEHAVIORS OF HYDROGENATED AMORPHOUS CARBON NITRIDE FILMS [C] . Junyan Zhang, Chengbing Wang Asia International Conference on Tribology . 2006

机译：表面氢键在氢化非晶碳氮膜摩擦行为中的作用
5. Investigation of the film properties and deposition process of hydrogenated amorphous carbon films deposited with a microwave ECR plasma reactor. [D] . Kim, Bo Keun. 2000

机译：用微波ECR等离子体反应器沉积氢化非晶碳膜的膜性能和沉积过程的研究。
6. Refinement of Sustainable Polybutylene Adipate Terephthalate (PBAT) with Amorphous Hydrogenated Carbon Films (a-C:H) Revealing Film Instabilities Influenced by a Thickness-Dependent Change of sp2/sp3 Ratio [O] . Torben Schlebrowski, Halima Acharchi, Barbara Hahn, 2020

机译：非晶氢化碳膜（a-C：H）精制可持续的聚己二酸对苯二甲酸丁二醇酯（PBAT）揭示了膜厚度随sp2 / sp3比率变化而变化的不稳定性
7. The effect of nitriding on the humidity sensing properties of hydrogenated amorphous carbon films [O] . Giuliano Frattini, Sindry Torres, Leonel I Silva, 2021

机译：氮化对氢化非晶碳膜湿度感应性能的影响
8. Study of the chemical, mechanical, and surface properties of thin films of hydrogenated amorphous carbon [R] . Vandentop, G. J. 1990

机译：研究氢化无定形碳薄膜的化学，机械和表面性质

Ripple surface generated on hydrogenated amorphous carbon nitride films

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