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首页> 外文期刊>Applied Surface Science >Recent advances in high-resolution X-ray diffractometry applied to nanostructured oxide thin films: The case of yttria stabilized zirconia epitaxially grown on sapphire
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Recent advances in high-resolution X-ray diffractometry applied to nanostructured oxide thin films: The case of yttria stabilized zirconia epitaxially grown on sapphire

机译：应用于纳米结构氧化物薄膜的高分辨率X射线衍射技术的最新进展：蓝宝石外延生长的氧化钇稳定氧化锆的案例

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The investigation of nanostructured oxide thin films using high-resolution X-ray diffraction (XRD) is considered. Because of the small amount of matter deposited and significant defect densities, such oxide thin film structures can be considered as imperfect materials that require specific data acquisition and data analysis methods. Fast reciprocal space mapping is carried out using a diffractometer based on an 18 kW X-ray source, a four-reflection monochromator and a curved position sensitive detector. In order to extract quantitative information concerning the microstructure of the films, an approach is developed that combines a microscopic modelling of dimensional effects (crystallite or island shape, size and size distribution) with a phenomenological description of lattice disorder. Within this approach, simple analytical expressions or expressions implying a simple Fourier transform, can be derived for the XRD intensity distribution in the direction perpendicular to the film surface and parallel to it. Profiles exhibiting damped and/or broadened fringes and profiles exhibiting a two-component line shape can be simulated. Parameters of primary interest, such as the island thickness, thickness distribution function, island in-plane dimensions and the distribution function of the dimensions, the level of disorder, the disorder correlation length and the spatial distribution of disorder, can be extracted. The applicability of the model is illustrated with yttria stabilized zirconia films epitaxially grown on sapphire by sol-gel dip-coating. (c) 2006 Elsevier B.V. All rights reserved.
机译：考虑使用高分辨率X射线衍射（XRD）研究纳米结构氧化物薄膜。由于少量的物质沉积和明显的缺陷密度，这种氧化物薄膜结构可以认为是不完美的材料，需要特定的数据采集和数据分析方法。使用基于18 kW X射线源的衍射仪，四反射单色仪和弯曲位置敏感检测器，可以进行快速的相互空间映射。为了提取有关薄膜微观结构的定量信息，开发了一种方法，该方法将尺寸效应的微观建模（微晶或岛状形状，尺寸和尺寸分布）与晶格异常的现象学描述相结合。在这种方法中，对于垂直于膜表面且平行于膜表面的方向的XRD强度分布，可以得出简单的分析表达式或暗示简单傅里叶变换的表达式。可以模拟显示出出现阻尼和/或加宽条纹的轮廓，以及显示出具有两个分量的线形的轮廓。可以提取出主要关注的参数，例如岛的厚度，厚度分布函数，岛内平面尺寸和尺寸的分布函数，无序程度，无序相关长度和无序的空间分布。通过溶胶-凝胶浸涂在蓝宝石上外延生长的氧化钇稳定的氧化锆膜说明了该模型的适用性。 （c）2006 Elsevier B.V.保留所有权利。

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