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Experimental and Modeling Study of the Fabrication of Mg Nano-Sculpted Films by Magnetron Sputtering Combined with Glancing Angle Deposition

机译:磁控溅射结合掠射角沉积法制备镁纳米雕刻膜的实验与模型研究

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Today, Mg is foreseen as one of the most promising materials for hydrogen storage when prepared as nano-objects. In this context, we have studied the fabrication of Mg nano-sculpted thin films by magnetron sputtering deposition in glancing angle configuration. It is demonstrated that the microstructure of the material is controllable by tuning important deposition parameters such as the tilt angle or the deposition pressure which both strongly affect the shadowing effect during deposition. As an example, the angle formed by the column and the substrate and the intercolumnar space varies between ~20° to ~50° and ~45 to ~120 nm, respectively, when increasing the tilt angle from 60° to 90°. These observations are highlighted by modeling the growth of the material using kinetic Monte Carlo methods which highlights the role of surface diffusion during the synthesis of the coating. This work is a first step towards the development of an air-stable material for hydrogen storage.
机译:如今,将镁制成纳米物体时,可以预见为最有前途的储氢材料之一。在这种情况下,我们研究了通过掠射角配置的磁控溅射沉积制备Mg纳米雕刻薄膜。通过调整重要的沉积参数,例如倾斜角或沉积压力,可以证明材料的微观结构是可控的,这两个参数都会强烈影响沉积过程中的遮蔽效果。例如,当将倾斜角从60°增加到90°时,由柱和基板以及柱间间隙形成的角度分别在〜20°至〜50°和〜45至〜120 nm之间变化。通过使用动力学蒙特卡洛方法对材料的生长进行建模来突出显示这些观察结果,该方法突出了涂层合成过程中表面扩散的作用。这项工作是开发用于储氢的空气稳定材料的第一步。

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