...
首页> 外文期刊>American journal of applied sciences >Investigation of Nano Structural Changes by Annealing Temperature and Uniform Oxygen Flow on Ti Layers | Science Publications
【24h】

Investigation of Nano Structural Changes by Annealing Temperature and Uniform Oxygen Flow on Ti Layers | Science Publications

机译:退火温度和均匀氧流在钛层上的纳米结构变化研究科学出版物

获取原文
           

摘要

> Problem statement: Ti films of the same thickness, deposition angle (near normal) and deposition rate were deposited on glass substrates at room temperature under UHV conditions. Approach: Different annealing temperatures 423 K, 523 K and 623 K with uniform 7 cm3 sec-1, oxygen flow, were used to produce titanium oxide layers. Results: Thin film structures were studied using AFM, XRD and spectrophotometer methods. Roughness of the films changed due to annealing process. Conclusion/Recommendations: The getting property of Ti and annealing temperature can play an important role on the structure of the films.
机译: > 问题陈述:在室温下,在超高压条件下,将具有相同厚度,沉积角度(接近法线)和沉积速率的Ti膜沉积在玻璃基板上。 方法:使用不同的退火温度423 K,523 K和623 K以均匀的7 cm 3 sec -1 (氧气流量)进行生产氧化钛层。 结果:采用原子力显微镜,X射线衍射和分光光度计对薄膜结构进行了研究。膜的粗糙度由于退火过程而改变。 结论/建议: Ti的获取性能和退火温度对薄膜的结构起着重要的作用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号