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首页> 外文期刊>International Journal of Electrochemical Science >Roughness, Hardness and Giant Magneto Resistance of Cu/Co Multilayers Prepared by Jet electrochemical deposition
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Roughness, Hardness and Giant Magneto Resistance of Cu/Co Multilayers Prepared by Jet electrochemical deposition

机译：喷射电化学沉积法制备Cu / Co多层膜的粗糙度，硬度和巨磁阻

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摘要

Cu/Co multilayer film was prepared on a Si substrate using a translational jet electrochemicaldeposition system. A scanning electron microscope, X-ray diffractometer, a 3D surface profilometer, adigital microhardness tester, and a physical property measurement system were used to characterizethe surface topography, microtexture, roughness, microhardness, and giant magnetoresistancerespectively. It was found that the surface morphology of the multilayer improved and the interfacebetween the Cu and Co layers was well-defined. The roughness and hardness of the multilayer aresuperior to those of single metal film. The Cu/Co multilayer exhibited an excellent giantmagnetoresistive ratio of 50.38%. The giant magnetoresistance increased with the increase in themultilayer cycle number and decreased when the cycle number exceeded 120. The multilayer preparedby this method has high sensitivity to magnetoresistive change and it is easy to control the multilayer’sresistance.
机译：使用平移喷射电化学沉积系统在Si基板上制备Cu / Co多层膜。分别使用扫描电子显微镜，X射线衍射仪，3D表面轮廓仪，数字显微硬度测试仪和物理性质测量系统来表征表面形貌，显微组织，粗糙度，显微硬度和巨磁电阻。发现该多层的表面形态得到改善并且Cu和Co层之间的界面被明确定义。多层膜的粗糙度和硬度优于单金属膜。 Cu / Co多层膜表现出优异的50.38％的巨磁阻比。巨大的磁阻随着多层循环数的增加而增加，而当循环数超过120时则减小。通过这种方法制得的多层膜对磁阻变化具有较高的敏感性，并且易于控制多层膜的电阻。

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