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首页> 外文期刊>Journal of Advanced Science >めっき法で作製したP型アンチモン?テルル薄膜の熱処理と拡散防止膜の導入による高性能化
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めっき法で作製したP型アンチモン?テルル薄膜の熱処理と拡散防止膜の導入による高性能化

机译：电镀法制得的P型锑防渗薄膜的热处理和引入防扩散膜的高性能

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摘要

We investigated the thermoelectric properties of electrodeposited Sb-Te thin films using thermal annealing and incorporating diffusion barrier layer between the stainless steel substrate and the Sb-Te thin film. Molybdenum (Mo) and nickel (Ni) films were used as a diffusion barrier layer. Surface morphology was observed by scanning electron microscope, and crystallographic characteristic was examined by X-ray diffraction analysis. In-plane thermoelectric properties, in terms of the electrical conductivity, Seebeck coefficient and power factor, were measured at room temperature. It was found that Sb-Te thin film with Mo layer exhibited higher thermoelectric performance compared to that of Sb-Te thin film with no diffusion barrier layer. This is because the impurity atoms from the substrate and Mo layer itself did not diffuse so much into Sb-Te layer. On the other hand, Sb-Te thin film with Ni layer exhibited the lower thermoelectric properties owing to the diffusion of Ni atoms into the Sb-Te thin film. Therefore, incorporation of Mo layer is beneficial to improve the thermoelectric properties of Sb-Te thin films by thermal annealing.
机译：我们通过热退火并在不锈钢基板和Sb-Te薄膜之间掺入了扩散阻挡层，研究了电沉积Sb-Te薄膜的热电性能。钼（Mo）和镍（Ni）膜用作扩散阻挡层。通过扫描电子显微镜观察表面形态，并且通过X射线衍射分析检查晶体学特性。在室温下测量面内热电性能，包括电导率，塞贝克系数和功率因数。发现具有Mo层的Sb-Te薄膜与没有扩散阻挡层的Sb-Te薄膜相比具有更高的热电性能。这是因为来自衬底和Mo层本身的杂质原子没有扩散到Sb-Te层中那么多。另一方面，具有Ni层的Sb-Te薄膜由于Ni原子扩散到Sb-Te薄膜中而表现出较低的热电特性。因此，掺入Mo层有利于通过热退火改善Sb-Te薄膜的热电性能。

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