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首页> 外文期刊>Bulletin of the American Physical Society >APS -Annual Meeting of the APS Four Corners Section- Event - Transport and magnetic properties of thin films fabricated by magnetron sputtering
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APS -Annual Meeting of the APS Four Corners Section- Event - Transport and magnetic properties of thin films fabricated by magnetron sputtering

机译：APS-APS四角分会年会-活动-磁控溅射制备的薄膜的传输和磁性

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Magnetron sputtering is a widely used technique for fabricating various thin film structures. We will present the design and construction of an ultra-high vacuum magnetron sputtering system. By avoiding the use of O-ring seals and using small chambers as the enclosure, the system maintains UHV efficiently and keeps the pumping time short. The small system size also worked economically well. This system has three sputtering guns for depositing metals or oxides. All sputtering guns are capable of accepting 1.5 and 2-inch targets. The designs have the capability of heating samples up to 800C while being sputtered and transferring the sample into another chamber without exposing samples to air. These greatly enhance our ability of thin film growth and reduce a risk of cross-contamination of systems or within a system. We will discuss the structural, magnetic and transport properties of the thin films fabricated by this system.
机译：磁控溅射是用于制造各种薄膜结构的广泛使用的技术。我们将介绍超高真空磁控溅射系统的设计和构造。通过避免使用O形圈密封件和使用小腔室作为外壳，系统可以有效地维持特高压，并缩短泵送时间。小系统规模在经济上也运作良好。该系统具有三个用于沉积金属或氧化物的溅射枪。所有的溅射枪都可以接受1.5英寸和2英寸的目标。这些设计具有在溅射时将样品加热到800°C的能力，并将样品转移到另一个腔室中，而无需将样品暴露在空气中。这些极大地增强了我们薄膜生长的能力，并降低了系统或系统内部交叉污染的风险。我们将讨论该系统制造的薄膜的结构，磁性和传输性能。

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