Correlations between operating conditions and microstructure of LPCVD films

B. Caussat; J.P. Couderc

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Correlations between operating conditions and microstructure of LPCVD films

机译：LPCVD薄膜的工作条件与微观结构之间的相关性

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Studying correlations between operating conditions and LPCVD films microstruc- ture constitutes nowadays one of the major industrial concerns, especially in microelectronics. A multidisciplinary working group has been created in 1997 to progress in this new and very ambitious research domain. This second article consists in a detailed bibliographic review of the literature works existing in this domain for the particular case of pure silicon deposit.

机译：研究工作条件与LPCVD薄膜微结构之间的相关性已成为当今主要的工业问题之一，尤其是在微电子领域。为了在这个新的，非常雄心勃勃的研究领域取得进展，1997年成立了一个多学科工作组。第二篇文章是对纯硅沉积物特殊情况在该领域中现有文献的详细书目综述。

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《Entropie》 |1999年第219期|p.2-13|共12页
作者
B. Caussat; J.P. Couderc;
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原文格式 PDF
正文语种 eng
中图分类热力工程、热机;
关键词
chemicl engineering; LPCVD; microstructure;

机译：化学工程;低压化学气相沉积;微观结构;

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专利

1. Correlations between operating conditions and microstructure of lpcvd films: part 5: sipos deposition from silane and nitrous oxide [J] . P.Barathieu, B.Caussat, E.Scheid Entropie . 2000,第227期

机译：lpcvd膜的工作条件与微观结构之间的关系：第5部分：硅烷和一氧化二氮的硅脂沉积
2. Correlations between operating conditions and microstructure of lpcvd films [J] . A.Dollet, B.Caussat, J.P.Couderc Entropie . 2000,第226期

机译：lpcvd薄膜的工作条件与微观结构之间的相关性
3. Correlations between operation conditions and microstructure of LPCVD films [J] . B. Caussat, A. Dollet, J.P. Couderc Entropie . 1999,第216期

机译：LPCVD薄膜的工作条件与微观结构之间的关系
4. The Stress and Microstructure analysis of Polycrystalline Silicon Films Deposited by LPCVD [C] . Y.T. Cherng, M.C. Boysel, B.D. Gates Amprphous and polycrystalline thin-film silicon science and technology - 2012. . 2012

机译：LPCVD沉积多晶硅膜的应力和微观结构分析
5. In situ stress measurement of thin film growth by electrochemical deposition: The correlations among stress, morphology, and microstructures [D] . Luo, Tianzhi 2008

机译：通过电化学沉积对薄膜生长进行原位应力测量：应力，形态和微观结构之间的相关性
6. Correlation between Crystal Structure Surface/Interface Microstructure and Electrical Properties of Nanocrystalline Niobium Thin Films [O] . L. R. Nivedita, Avery Haubert, Anil K. Battu, 2020

机译：晶体结构表面/界面微观结构与纳米铌薄膜的电性能的相关性
7. Correlations between operating conditions, microstructure and mechanical properties of twin wire arc sprayed steel coatings [O] . In A, H. Liao A, Z. Q. Feng B, 2002

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8. Conditions for Tunnel Formation in LPCVD (Low Pressure Chemical Vapor Deposition) Tungsten Films on Single Crystal Silicon [R] . Blewer, R. S. , Headley, T. J. , Tracy, M. E. 1987

机译：单晶硅上LpCVD（低压化学气相沉积）钨膜隧道形成条件

Correlations between operating conditions and microstructure of LPCVD films

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