Influence of the Window Thermal Diffusivity on the Silicon Wafer Temperature in a Rapid Thermal System

PIERRE-OLIVIER LOGERAIS; RAOUF KHELALFA; OLIVIER RIOU; JEAN-FELIX DURASTANTI; ANNE BOUTEVILLE

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Influence of the Window Thermal Diffusivity on the Silicon Wafer Temperature in a Rapid Thermal System

机译：快速热系统中窗口热扩散率对硅晶片温度的影响

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The heating of a silicon wafer in a rapid thermal process is studied by numerical simulation. In the model, the equations of conservation of mass and energy are solved with the finite-volume method and the determination of the solutions of the radiative transfer equation is based on the Monte-Carlo method. The results of numerical simulations, without optimization and in steady state, show a close relationship between the thermal profiles of the silicon wafer and the ones of the quartz window. By introducing a high thermal diffusivity value for the window, the homogeneity of the wafer temperature is improved by 54%. The effect of heat storage by the quartz window on the temperature profile of the silicon substrate is hence well appreciated. Finally, a selection of materials is proposed for the implementation of the high diffusivity infrared window.

机译：通过数值模拟研究了快速热处理过程中硅晶片的加热。在该模型中，用有限体积法求解质量和能量守恒方程，并根据蒙特卡洛方法确定辐射传递方程的解。未经优化且处于稳定状态的数值模拟结果表明，硅晶片的热剖面与石英窗口的热剖面之间具有密切的关系。通过为窗口引入高的热扩散率值，晶片温度的均匀性提高了54％。因此，通过石英窗进行的热存储对硅衬底的温度分布的影响是众所周知的。最后，提出了用于实现高扩散率红外窗口的材料选择。

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来源
《Heat Transfer Engineering》 |2015年第15期|1111-1121|共11页
作者
PIERRE-OLIVIER LOGERAIS; RAOUF KHELALFA; OLIVIER RIOU; JEAN-FELIX DURASTANTI; ANNE BOUTEVILLE;
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作者单位

CERTES, Universite Paris-Est, IUT de Senart, Lieusaint, France,Universite Paris-Est Creteil (UPEC), IUT de Senart-Fontainebleau, Departement Genie Industriel et Maintenance (GIM), Rue Georges Charpak, 77567 Lieusaint Cedex, France;

CERTES, Universite Paris-Est, IUT de Senart, Lieusaint, France;

CERTES, Universite Paris-Est, IUT de Senart, Lieusaint, France;

CERTES, Universite Paris-Est, IUT de Senart, Lieusaint, France;

LAMPA, Arts et Metiers ParisTech, Angers, France;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
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1. Improvement of temperature homogeneity of a silicon wafer heated in a rapid thermal system (RTP: Rapid Thermal Process) by a filtering window [J] . Logerais Pierre-Olivier, Riou Olivier, Delaleux Fabien, Applied thermal engineering: Design, processes, equipment, economics . 2015,第Null期

机译：通过过滤窗口提高在快速热系统（RTP：快速热工艺）中加热的硅晶片的温度均匀性
2. Thermal uniformity of 12-in silicon wafer in linearlyramped-temperature transient rapid thermal processing [J] . Senpuu Lin, Hsin-Sen Chu IEEE Transactions on Semiconductor Manufacturing . 2001,第2期

机译：线性升温温度瞬态快速热处理中12英寸硅片的热均匀性
3. Enhanced internal gettering of iron in n~+ epitaxial silicon wafer: Effect of high temperature rapid thermal annealing in nitrogen ambient [J] . Peng Dong, Xingbo Liang, Daxi Tian, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2016,第Null期

机译：n / n〜+外延硅晶片中铁的增强的内部吸杂：氮环境中高温快速热退火的影响
4. Laser Ultrasonic Instrumentation for Accurate Temperature Measurement of Silicon Wafers in Rapid Thermal Processing Systems [C] . Dan Klimek, Brian Anthony, Agostino Abbate, Symposium on rapid thermal and integrated processing . 1998

机译：激光超声仪器，用于快速热处理系统中硅晶片的准确温度测量
5. Measurement and control of silicon wafer temperature and oxide film thickness in rapid thermal processing using in situ ellipsometry. [D] . Sampson, Ronald Kevin. 1992

机译：使用原位椭偏仪在快速热处理中测量和控制硅片温度和氧化膜厚度。
6. Manipulating the adhesion of electroless nickel-phosphorus film on silicon wafers by silane compound modification and rapid thermal annealing [O] . Chin-Wei Hsu, Wei-Yen Wang, Kuan-Ting Wang, -1

机译：通过硅烷化合物改性和快速热退火处理化学镀镍磷膜在硅片上的附着力
7. Influence of the window thermal diffusivity on the silicon wafer temperature in a rapid thermal system [O] . LOGERAIS, Pierre-Olivier, KHELALFA, Raouf, RIOU, Olivier, 2015

机译：快速热系统中窗口热扩散率对硅片温度的影响
8. Calibration of High Temperature Thermal Conductivity System: New Algorithm to Measure Heat Capacity Using Flash Thermal Diffusivity in Thermoelectric Materials [R] . Deb, Rahul, Snyder, Jeff G. 2005

机译：高温导热系统的标定：利用热电材料中闪光热扩散率测量热容的新算法

Influence of the Window Thermal Diffusivity on the Silicon Wafer Temperature in a Rapid Thermal System

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