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850-nm VCSELs With p-Type δ -Doping in the Active Layers for Improved High-Speed and High-Temperature Performance

机译:有源层中具有p型δ掺杂的850 nm VCSEL,可提高高速和高温性能

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摘要

In this paper, we study the influence of p-type modulation doping on the dynamic/static performance of high-speed 850-nm VCSELs with highly strained multiple quantum wells. The studied device structure has a 3/2 λ asymmetric cavity design, which can let the internal transit time of injected carriers be as short as that of 1/2 λ cavity design and further improve its performance in terms of speed and output power for high single-mode operation. Our proposed VCSEL structure with p-type doping shows superior modulation speed with an output power comparable with that of the un-doped reference device under room temperature operation. Furthermore, when the operating temperature reaches 85 °C, there is a significant improvement in both the modulation speed and maximum power of the p-doped structures. According to our simulation, this can be attributed to the change in the quasi-Fermi levels of the injected carriers after the addition of p-doping in the active layers, which minimizes the electron leakage under high-temperature operation.
机译:在本文中,我们研究了p型调制掺杂对具有高应变多量子阱的高速850 nm VCSEL的动态/静态性能的影响。所研究的器件结构具有3/2λ非对称腔设计,可以使注入的载流子的内部传输时间短于1/2λ腔设计的时间,并在提高速度和输出功率方面进一步提高性能单模运行。我们提出的带有p型掺杂的VCSEL结构在室温操作下显示出优异的调制速度,其输出功率可与未掺杂参考器件相比。此外,当工作温度达到85°C时,p掺杂结构的调制速度和最大功率都得到了显着改善。根据我们的模拟,这可以归因于在有源层中添加p掺杂之后注入的载流子的准费米能级的变化,这使高温操作下的电子泄漏最小化。

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