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In situ patterning of organic molecules in aqueous solutions using an inverted electron-beam lithography system

机译:使用反向电子束光刻系统对水溶液中的有机分子进行原位成像

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摘要

A method for in situ controlling the detachment and deposition of organic molecules such as sugars and biocompatible polymers in aqueous solutions by electron-beam (EB) scan is proposed and evaluated. It was demonstrated that EB irradiation could detach 2-methacryloyloxyethyl phosphorylcholine (MPC) polymers from a silicon nitride membrane. Moreover, organic molecules such as cationic polymers and sugars could be deposited on the membrane by EB irradiation. Spatial distributions of scattered electrons were numerically simulated, and acceleration voltage dependences of the detachment and deposition phenomena were experimentally measured. The simulations and experimental results suggest that the detachment of MPC polymers is mainly due to electrical effects of primary electrons, and that the deposition of organic molecules is mainly due to chemical reactions induced by primary electrons. In view of these findings, the proposed method can be applied to in situ and nanoscale patterning such as the fabrication of cell scaffolds. (C) 2016 The Japan Society of Applied Physics
机译:提出并评估了一种通过电子束(EB)扫描原位控制有机分子(如糖和生物相容性聚合物)在水溶液中的脱离和沉积的方法。结果表明,EB辐射可以从氮化硅膜上分离出2-甲基丙烯酰氧基氧乙基磷酰胆碱(MPC)聚合物。此外,有机分子如阳离子聚合物和糖可通过EB辐射沉积在膜上。数值模拟了散射电子的空间分布,并通过实验测量了加速电压对分离和沉积现象的依赖性。仿真和实验结果表明,MPC聚合物的脱离主要是由于一次电子的电效应,而有机分子的沉积主要是由于一次电子引起的化学反应。鉴于这些发现,所提出的方法可以应用于原位和纳米级图案化,例如细胞支架的制造。 (C)2016年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2016年第6s1期|06GL07.1-06GL07.6|共6页
  • 作者单位

    Univ Tokyo, Grad Sch Informat Sci & Technol, Dept Informat Phys & Comp, Bunkyo Ku, Tokyo 1138656, Japan|Japan Soc Promot Sci, Chiyoda Ku, Tokyo 1020083, Japan;

    Univ Tokyo, Sch Engn, Dept Mat Engn, Bunkyo Ku, Tokyo 1138656, Japan|Univ Tokyo, Sch Engn, Dept Bioengn, Bunkyo Ku, Tokyo 1138656, Japan;

    Univ Tokyo, Grad Sch Informat Sci & Technol, Dept Informat Phys & Comp, Bunkyo Ku, Tokyo 1138656, Japan;

    Univ Tokyo, Grad Sch Informat Sci & Technol, Dept Informat Phys & Comp, Bunkyo Ku, Tokyo 1138656, Japan;

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