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机译:Si衬底上生长的GaN中的黄色发光带的性质
Department of Electrical and Electronic Engineering, Aichi Institute of Technology, Toyota, Aichi 470-0392, Japan;
Department of Electrical and Electronic Engineering, Aichi Institute of Technology, Toyota, Aichi 470-0392, Japan;
Department of Electrical and Electronic Engineering, Aichi Institute of Technology, Toyota, Aichi 470-0392, Japan;
Department of Applied Sciences, Korea Maritime and Ocean University, Busan 606-791, Korea;
Department of Electronics and Akasaki Research Center, Nagoya University, Nagoya 464-8603, Japan;
Department of Electronics and Akasaki Research Center, Nagoya University, Nagoya 464-8603, Japan;
Department of Electronics and Akasaki Research Center, Nagoya University, Nagoya 464-8603, Japan;
Department of Electronics and Akasaki Research Center, Nagoya University, Nagoya 464-8603, Japan;
Department of Electronics and Akasaki Research Center, Nagoya University, Nagoya 464-8603, Japan;
机译:MOVPE在蓝宝石衬底上生长的未掺杂GaN中的带隙与黄色发光之间的竞争
机译:生长的高电阻GaN和无意掺杂GaN膜中黄色发光的不同来源
机译:在氢化物气相外延生长的低缺陷密度极性和非极性独立式GaN衬底上的时间分辨光致发光,正电子ni灭和Al0.23Ga0.77N / GaN异质结构生长研究
机译:MOCVD生长GaN层电阻率和黄色发光强度的相关性
机译:通过发光光谱和X射线衍射测定在6H-SiC(0001)衬底上生长的GaN和Al(x)Ga(1-x)N薄膜的应变和组成。
机译:通过共焦拉曼光谱和光致发光光谱法对图案化蓝宝石衬底上生长的GaN基发光二极管进行三维表征
机译:MOCVD在块状GaN衬底上生长的Mg掺杂的m面GaN的光致发光