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首页> 外文期刊>Japanese journal of applied physics >Optimization Of Amorphous Silicon Oxide Buffer Layer For High-efficiency P-type Hydrogenated Microcrystalline Silicon Oxide-type Crystalline Silicon Heterojunction Solar Cells
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Optimization Of Amorphous Silicon Oxide Buffer Layer For High-efficiency P-type Hydrogenated Microcrystalline Silicon Oxide-type Crystalline Silicon Heterojunction Solar Cells

机译:高效P型氢化微晶硅/ n型晶体硅异质结太阳能电池非晶硅缓冲层的优化

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摘要

Intrinsic hydrogenated amorphous silicon oxide (i-a-SiO:H) films deposited by very high frequency plasma-enhanced chemical vapor deposition (60 MHz VHF-PECVD) at a low substrate temperature of approximately 200 ℃ were used as a front buffer layer in p-type hydrogenated microcrystalline silicon oxide-type crystalline silicon (p-μc-SiO:H-c-Si) heterojunction solar cells. We found that the oxygen concentration in the i-a-SiO:H buffer layer strongly affected the solar cell performance and that the short wavelength response in quantum efficiency (QE) was improved by oxygen addition. Employing a p-μc-SiO:H/i-a-SiO:H-Si [Czochralski (CZ), 200 μm, (100)]/i-a-Si:H-a-Si:H/Ag/Al configuration, we achieved an efficiency of 17.9% with V_(oc) of 671 mV.
机译:通过在大约200℃的低基板温度下通过超高频等离子体增强化学气相沉积(60 MHz VHF-PECVD)沉积的本征氢化非晶硅氧化物(ia-SiO:H)膜用作p-型氢化微晶氧化硅/ n型结晶硅(p-μc-SiO:H / nc-Si)异质结太阳能电池。我们发现i-a-SiO:H缓冲层中的氧浓度强烈影响太阳能电池的性能,并且通过添加氧可以改善量子效率(QE)中的短波长响应。采用p-μc-SiO:H / ia-SiO:H / n-Si [直拉(CZ),200μm,(100)] / ia-Si:H / na-Si:H / Ag / Al构型我们以671 mV的V_(oc)实现了17.9%的效率。

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