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首页> 外文期刊>Japanese Journal of Applied Physics. Part 2, Letters & Express Letters >Growth of AlN and GaN by Metalorganic Chemical Vapor Deposition on BP Synthesized by Flux Method
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Growth of AlN and GaN by Metalorganic Chemical Vapor Deposition on BP Synthesized by Flux Method

机译:助焊剂法合成的BP金属有机化学气相沉积法生长AlN和GaN

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摘要

BP with the size of 50 μm to 3 mm was synthesized by the Cu flux method. The BP crystals have a zincblend structure, and the lattice constant and the cathodoluminescence peak wavelength were 4.557 A and 370 nm, respectively. GaN and AlN were grown by metalorganic chemical vapor deposition on BP. It was found that AlN grown at 1150℃ on (100)BP was grown smoothly but that grown on (111)BP had a rough surface. GaN, however, was irregularly grown on both (100) and (111)BP. It was demonstrated that AlN on (100)BP is another candidate as a substrate for a UV-light-emitting diode.
机译:通过Cu助熔剂法合成了尺寸为50μm至3mm的BP。 BP晶体具有锌共混物结构,晶格常数和阴极发光峰波长分别为4.557 A和370 nm。 GaN和AlN通过在BP上的金属有机化学气相沉积法生长。结果表明,在(150)BP上于1150℃生长的AlN生长平稳,而在(111)BP上生长的AlN表面粗糙。但是,GaN在(100)和(111)BP上均不规则地生长。已经证明,在(100)BP上的AlN是另一种候选物作为UV发光二极管的衬底。

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