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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Multiscale Monte Carlo Simulation of Circular DC Magnetron Sputtering: Influence of Magnetron Design on Target Erosion and Film Deposition
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Multiscale Monte Carlo Simulation of Circular DC Magnetron Sputtering: Influence of Magnetron Design on Target Erosion and Film Deposition

机译：圆形直流磁控溅射的多尺度蒙特卡洛模拟：磁控管设计对靶冲蚀和膜沉积的影响

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摘要

We present an experimental and computational study of the effect of magnetron design on the target erosion profile, wafer-level deposition uniformity, and feature-scale deposition topography in a circular DC magnetron sputtering system. We have conducted a multiscale Monte Carlo simulation consisting of a particle-in-cell Monte Carlo collision plasma simulation for target sputter erosion, a collisional transport simulation for film deposition, and a feature-scale deposition topography simulation. The entire simulation results for each step are verified in comparison with the experimental results for various process conditions. A new semiempirical calibration method, for converting an estimated ion current density distribution into a target erosion profile, is proposed with regard to the gas rarefaction effect due to sputtering wind. In conclusion, the whole performance indices of a circular DC magnetron sputtering system are substantially influenced by magnetron design, and the effectiveness of our multiscale Monte Carlo simulation methodology is validated.
机译：我们介绍了在圆形直流磁控溅射系统中，磁控管设计对目标腐蚀轮廓，晶片级沉积均匀性和特征尺度沉积形貌的影响的实验和计算研究。我们已经进行了多尺度的蒙特卡洛模拟，包括用于靶溅射腐蚀的粒子内蒙特卡洛碰撞等离子体模拟，用于膜沉积的碰撞传输模拟以及特征尺度的沉积形貌模拟。与各个过程条件下的实验结果相比，可以验证每个步骤的整个模拟结果。针对溅射风引起的气体稀疏效应，提出了一种新的半经验标定方法，用于将估计的离子电流密度分布转换为目标侵蚀曲线。总之，圆形直流磁控溅射系统的整体性能指标受磁控管设计的实质影响，并且验证了我们多尺度蒙特卡洛模拟方法的有效性。

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