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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography
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Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography

机译：超数值孔径浸没式光刻的具有不同偏振的单一抗反射涂层优化

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摘要

Immersion lithography uses a hyper-numerical aperture (NA) to make smaller patterns and this hyper-NA imaging needs serious consideration of polarization effects. Immersion lithography using a hyper-NA affects the selection and optimization of various resolution enhancement techniques. Increasing the NA means a higher substrate reflectivity owing to a higher incidence angle. Thus, reflectivity should be considered with polarization in immersion lithography. Reflectivity at the resist-substrate interface has been a concern in the fabrication of many devices. To control the critical dimensions and the swing curve, we usually use anti-reflection coating (ARC). Lithography has become increasingly dependent on ARC to reduce reflectivity. If ARC has optimum parameters such as refractive index and thickness, we can obtain reduced reflectivity through the destructive interference of light. We suggest that different polarization states require different thicknesses of ARC to control reflectivity. The consideration of reflectivity based on a hyper-NA is also investigated. Different polarization states in terms of different ARC thicknesses for controlling reflectivity are also studied. The fidelity of different patterns is valid with different polarization states for reflectivity reduction. The substrate and resist reflectivity affect the line width swing curve. Therefore, we studied the effects of reflectivity on immersion lithography.
机译：浸没式光刻使用超数值孔径（NA）来制作更小的图案，这种超NA成像需要认真考虑偏振效应。使用超NA的浸没式光刻技术会影响各种分辨率增强技术的选择和优化。 NA的增加是由于入射角较大而意味着基板的反射率较高。因此，在浸没式光刻中应考虑偏振的反射率。在许多器件的制造中，抗蚀剂-衬底界面处的反射率一直是关注的问题。为了控制关键尺寸和摆动曲线，我们通常使用抗反射涂层（ARC）。光刻技术越来越依赖于ARC来降低反射率。如果ARC具有最佳的参数（例如折射率和厚度），则可以通过光的相消干涉获得降低的反射率。我们建议不同的偏振态需要不同的ARC厚度来控制反射率。还研究了基于超NA的反射率的考虑。还研究了用于控制反射率的不同ARC厚度的不同偏振态。不同图案的保真度对于减少反射率的不同偏振态有效。基材和抗蚀剂的反射率会影响线宽摆动曲线。因此，我们研究了反射率对浸没式光刻的影响。

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