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首页> 外文期刊>Journal of Applied Physics >Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures
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Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures

机译：使用C / H / Ar气体混合物的微波等离子体增强化学气相沉积反应器中的等离子体化学过程

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摘要

Microwave (MW) plasma-enhanced chemical vapor deposition (PECVD) reactors are widely used for growing diamond films with grain sizes spanning the range from nanometers through microns to millimeters. This paper presents a detailed description of a two-dimensional model of the plasma-chemical activation, transport, and deposition processes occurring in MW activated H/C/Ar mixtures, focusing particularly on the following base conditions: 4.4%CH_4/7%Ar/balance H_2, pressure p=150 Torr, and input power P-1.5 kW. The model results are verified and compared with a range of complementary experimental data in the companion papers. These comparators include measured (by cavity ring down spectroscopy) C_2(a), CH(X), and H(n = 2) column densities and C_2(a) rotational temperatures, and infrared (quantum cascade laser) measurements of C_2H_2 and CH_4 column densities under a wide range of process conditions. The model allows identification of spatially distinct regions within the reactor that support net CH_4→C_2H_2 and C_2H_2→CH_4 conversions, and provide a detailed mechanistic picture of the plasma-chemical transformations occurring both in the hot plasma and in the outer regions. Semianalytical expressions for estimating relative concentrations of the various C_1H_x species under typical MW PECVD conditions are presented, which support the consensus view regarding the dominant role of CH_3 radicals in diamond growth under such conditions.
机译：微波（MW）等离子体增强化学气相沉积（PECVD）反应器被广泛用于生长晶粒尺寸范围从纳米到微米到毫米的金刚石膜。本文详细描述了MW活化的H / C / Ar混合物中发生的等离子体化学活化，传输和沉积过程的二维模型，特别关注以下基本条件：4.4％CH_4 / 7％Ar /平衡H_2，压力p = 150 Torr，输入功率P-1.5 kW。验证了模型结果，并与随附论文中的一系列补充实验数据进行了比较。这些比较器包括（通过腔衰荡光谱法）测量的C_2（a），CH（X）和H（n = 2）列密度和C_2（a）旋转温度，以及C_2H_2和CH_4的红外（量子级联激光）测量各种工艺条件下的色谱柱密度。该模型可以识别反应堆中支持净CH_4→C_2H_2和C_2H_2→CH_4转化的空间不同区域，并提供在热等离子体和外部区域中发生的等离子体化学转化的详细机理图。提出了用于估计在典型的MW PECVD条件下各种C_1H_x物种的相对浓度的半分析表达式，这支持了关于在这种条件下CH_3自由基在金刚石生长中的主导作用的共识观点。

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  • 来源
    《Journal of Applied Physics》 |2008年第11期|166-176|共11页
  • 作者

    Yuri A. Mankelevich; Michael N. R. Ashfold; Jie Ma;

  • 作者单位

    Skobel'tsyn Institute of Nuclear Physics, Moscow State University, Vorob'evy gory, Moscow 119991, Russia;

    School of Chemistry, University of Bristol, Bristol BS8 ITS, United Kingdom;

    School of Chemistry, University of Bristol, Bristol BS8 ITS, United Kingdom;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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