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首页> 外文期刊>Journal of Crystal Growth >The application of Madyoh topography for the study of GaAs layers grown by epitaxial lateral overgrowth
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The application of Madyoh topography for the study of GaAs layers grown by epitaxial lateral overgrowth

机译:Madyoh形貌在外延横向生长的GaAs层研究中的应用

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摘要

The surface morphology of GaAs layers grown by epitaxial lateral overgrowth is studied by Makyoh topography. Bending of the individual stripes of the layer are observed and quantified. Various defects related to the imperfections Of the growth are also observed. The results are compared to surface-stylus and X-ray diffraction measurements. The results show that Makyoh technique is a useful tool for simple, fast and routine assessment of such Structures.
机译:通过Makyoh形貌研究了外延横向过生长生长的GaAs层的表面形态。观察并量化该层的各个条纹的弯曲。还观察到与生长缺陷有关的各种缺陷。将结果与表面探针和X射线衍射测量结果进行比较。结果表明,Makyoh技术是简单,快速和常规评估此类结构的有用工具。

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