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首页> 外文期刊>Journal of Crystal Growth >Dopant distribution in selectively regrown InP: Fe studied by time-resolved photoluminescence
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Dopant distribution in selectively regrown InP: Fe studied by time-resolved photoluminescence

机译:通过时间分辨光致发光研究选择性再生InP:Fe中的杂质分布

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摘要

We apply time-resolved photoluminescence with 1 μm spatial resolution for the characterization fo iron distribution in semi-insulating InP:Fe epitaxial layers regrown by hydride vapor-phase epitaxy around etched mesas. The InP:Fe regrowth was carried out on InP:S mesas etched both along the [110] and [110] crystallographic directions, as well as on InP/InGaAsP in-plane lasers. In all cases, the Fe concentration was found to be close to the target values and showed little variation along the regrown layers.
机译:我们将具有1μm空间分辨率的时间分辨光致发光用于刻蚀台面周围氢化物气相外延生长的半绝缘InP:Fe外延层中的铁分布特征。在沿[110]和[110]晶体学方向蚀刻的InP:S台面以及InP / InGaAsP平面激光器上进行了InP:Fe的再生。在所有情况下,发现Fe浓度均接近目标值,并且沿再生长层几乎没有变化。

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