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机译:反应磁控溅射沉积(Cu,Li)共掺杂ZnO薄膜的室温铁磁性和铁电行为
Accelerator Laboratory, Department of Physics and Key Laboratory of Acoustic Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China Quantum Functional Semiconductor Research Center, Dongguk University, Seoul 100-715, Republic of Korea;
Accelerator Laboratory, Department of Physics and Key Laboratory of Acoustic Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;
Accelerator Laboratory, Department of Physics and Key Laboratory of Acoustic Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;
Accelerator Laboratory, Department of Physics and Key Laboratory of Acoustic Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;
Accelerator Laboratory, Department of Physics and Key Laboratory of Acoustic Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;
Accelerator Laboratory, Department of Physics and Key Laboratory of Acoustic Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;
Accelerator Laboratory, Department of Physics and Key Laboratory of Acoustic Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;
Quantum Functional Semiconductor Research Center, Dongguk University, Seoul 100-715, Republic of Korea;
A1 Magnetic fields; A3 Physical vapor deposition processes; B1 Oxides; B2 Semiconducting II-VI materials;
机译:反应磁控溅射沉积p型(Mn,Li)共掺杂ZnO薄膜中相关的室温铁磁性的缺陷
机译:螺旋磁控溅射沉积Cu掺杂ZnO薄膜的室温铁磁性
机译:射频和直流磁控管同时溅射在不同衬底温度下沉积的ZnO / Cu / ZnO多层膜的性能
机译:真空退火温度对DC磁控反应溅射沉积的Ga掺杂ZnO膜性能的影响
机译:在高温“智能”摩擦应用中,在封闭场不平衡磁控溅射中反应性沉积的氮化铝压电薄膜。
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:螺旋磁控溅射沉积Cu掺杂ZnO薄膜的室温铁磁性