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Growth and characterization of ZnO films on (001), (100) and (010) LiGaO_2 substrates

机译:(001),(100)和(010)LiGaO_2衬底上ZnO膜的生长和表征

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摘要

ZnO films were fabricated on LiGaO_2 (001), (100) and (010) planes by RF magnetron sputtering. The structural, morphological and optical properties of as-grown ZnO films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), Raman spectra and photoluminescence (PL) spectra. It is found that the orientation of ZnO films is strongly dependent on the substrate plane. [0001], [1100] and [1120] oriented ZnO films are deposited on LiGaO_2 (001), (100) and (010), respectively. AFM shows the (0001) ZnO film consists of well-aligned regular hexagonal grains. Raman spectra reveal a tensile stress in the (0001) ZnO film and a compressive stress in (1100) and (1120) ZnO films. PL spectra of all ZnO films exhibit only a near-band-edge UV emission peak.
机译:通过射频磁控溅射在LiGaO_2(001),(100)和(010)平面上制备了ZnO薄膜。通过X射线衍射(XRD),原子力显微镜(AFM),拉曼光谱和光致发光(PL)光谱研究了生长的ZnO薄膜的结构,形态和光学性质。发现ZnO膜的取向强烈地依赖于基板平面。 [0001],[1100]和[1120]取向的ZnO膜分别沉积在LiGaO_2(001),(100)和(010)上。 AFM显示(0001)ZnO薄膜由排列良好的规则六边形晶粒组成。拉曼光谱显示(0001)ZnO膜中的拉应力和(1100)和(1120)ZnO膜中的压应力。所有ZnO薄膜的PL光谱仅显示近带边缘的UV发射峰。

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