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首页> 外文期刊>Journal of Crystal Growth >Effect of antimony on the density of InAs/Sb:GaAs(l 00) quantum dots grown by metalorganic chemical-vapor deposition
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Effect of antimony on the density of InAs/Sb:GaAs(l 00) quantum dots grown by metalorganic chemical-vapor deposition

机译:锑对金属有机化学气相沉积法生长InAs / Sb:GaAs(l 00)量子点密度的影响

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摘要

We report the fabrication of high-density InAs quantum dots (QDs) grown on GaAs(1 0 0) substrate by metalorganic chemical-vapor deposition (MOCVD), obtained by antimony surfactant-mediated growth. We achieved InAs/Sb:GaAs QDs with dot density ranging from 2 × 10~(10)cm to 2-11 × 10~(11)cm~(-2), with complete suppression of coalescence. We studied the dependence of the total dot density and the density of coalesced dots on the growth conditions, such as antimony irradiation time, growth temperature and growth rate. Strongly enhanced PL intensity at room temperature (RT) was obtained from InAs/Sb:GaAs QDs with density above 4 × 10~(10)cm~(-2), compared to reference InAs/GaAs QDs.
机译:我们报告通过锑表面活性剂介导的生长获得的金属有机化学气相沉积(MOCVD),在GaAs(1 0 0)衬底上生长的高密度InAs量子点(QDs)的制造。我们获得了InAs / Sb:GaAs量子点,其点密度范围从2×10〜(10)cm到2-11×10〜(11)cm〜(-2),完全抑制了聚结。我们研究了总点密度和聚结点密度对生长条件(如锑辐照时间,生长温度和生长速率)的依赖性。与参考InAs / GaAs QD相比,密度高于4×10〜(10)cm〜(-2)的InAs / Sb:GaAs QDs在室温下(RT)增强了PL强度。

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