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首页> 外文期刊>Journal of Crystal Growth >The growth of ZnSe by photo-assisted metalorganic chemcial vapor deposition (MOCVD)
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The growth of ZnSe by photo-assisted metalorganic chemcial vapor deposition (MOCVD)

机译:通过光辅助金属有机化学气相沉积(MOCVD)生长ZnSe

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摘要

ZeSe epitaxy layers were grownon (1 0 0)GaAs substrates by photo-assisted MOCVD using DMZn and DMSe as group II and VI sources, respectively. Irradiation can improve the growth rate efficently, but the irradiation intensity influences the growth rate and the crystalline quality negligibly in a large range. Due to an oxidation reaction on the surface of ZnSe, the growth rate and the flow ratio of group II and VI sources influence the crystalline quality.
机译:通过分别使用DMZn和DMSe作为II组和VI组源的光辅助MOCVD在(1 0 0)GaAs衬底上生长ZeSe外延层。辐照可以有效地提高生长速率,但是辐照强度在很大范围内对生长速率和晶体质量的影响可忽略不计。由于ZnSe表面的氧化反应,Ⅱ,Ⅵ族源的生长速率和流量比影响了结晶质量。

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