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首页> 外文期刊>Journal of Crystal Growth >Influence of different V-grooved GaAs substrates on the geometrical shape of InGaAs/GaAs quantum wires
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Influence of different V-grooved GaAs substrates on the geometrical shape of InGaAs/GaAs quantum wires

机译:不同的V型槽GaAs衬底对InGaAs / GaAs量子线的几何形状的影响

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摘要

The structure of InGaAs/GaAs quantum wires (QWRs) grown on V-grooved GaAs substrates by low pressure metalorganic vapor phase epitaxy was studied by conventional and high resolution transmission electron microscopy. We show that, by growing the structure on grooves with (3 1 1)A-like and (1 1 1)A-lie oriented facts, the quantum wire profile can be changed from a constant thickness bent layer to a strongly tapered quantum wire of crescent shape. Highly uniform arrays of vertically stacked wires with a narrow size distribution along the growth direction have been obtained for both structures.
机译:通过常规的高分辨率透射电子显微镜研究了通过低压金属有机气相外延在V型槽GaAs衬底上生长的InGaAs / GaAs量子线(QWR)的结构。我们表明,通过在具有(3 1 1)A类和(1 1 1)A-lie取向的事实的沟槽上生长结构,量子线轮廓可以从恒定厚度的弯曲层更改为强锥形量子线新月形。对于两种结构,已经获得了沿生长方向具有窄尺寸分布的高度堆叠的垂直堆叠的线的高度均匀的阵列。

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