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首页> 外文期刊>Journal of Crystal Growth >Single-crystal GaN pyramids grown on (1 1 1)Si substrates by selective lateral overgrowth
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Single-crystal GaN pyramids grown on (1 1 1)Si substrates by selective lateral overgrowth

机译:通过选择性横向过度生长在(1 1 1)Si衬底上生长的单晶GaN金字塔

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摘要

Single-crystalline GaN/AIN layers have been grown on (1 1 1)Si substrates and subsequently used as seeding layer for selective lateral overgrowth on a patterned Si_3N_4 mask. GaN pyramids are formed during the lateral overgrowth. They are epitactically oriented with respect to the Si substrate wtih theorientation relationships [1 1 2 0]_(GsN)‖[1 1 0]_(si) and (0 0 1)_(GaN)‖(1 1 1)_(si). The pyramids were characterized by transmission electron microscopy and were found to have a reduced defect density compred with continuous layers of GaN on Si and very few defects in the upper portion.
机译:单晶GaN / AIN层已在(1 1 1)Si衬底上生长,随后用作籽晶层,用于在图案化的Si_3N_4掩模上进行选择性的横向过度生长。 GaN锥体在横向过长期间形成。它们通过取向关系[1 1 2 0] _(GsN)” [1 1 0] _(si)和(0 0 1)_(GaN)”(1 1 1)_相对于硅衬底在取向上取向(si)。通过透射电子显微镜对金字塔进行了表征,发现金字塔具有连续的Si上的GaN层,上部的缺陷极少,因此缺陷密度降低。

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