Secondary Ion Mass Spectrometry and Time-of-Flight Secondary Ion Mass Spectrometry Study of Impurity Measurements in HgCdTe

Steve Price; Larry Wang; Alice Wang; Arwa Ginwalla; Ian Mowat

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Secondary Ion Mass Spectrometry and Time-of-Flight Secondary Ion Mass Spectrometry Study of Impurity Measurements in HgCdTe

机译：HgCdTe中杂质测量的二次离子质谱和飞行时间二次离子质谱研究

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In this study, time-of-flight (TOF) secondary ion mass spectrometry (SIMS) was compared against dynamic SIMS to determine detection limits and background levels for nine impurities: Li, Na, K, Al, Ni, As, In, Fe, and Cu. Statistics were gathered by measuring six material test structure samples from six different liquid phase epitaxy (LPE) HgCdTe double layer heterojunction (DLHJ) wafers. Also included is a comparison between dynamic SIMS and TOF-SIMS capabilities.

机译：在这项研究中，将飞行时间（TOF）二次离子质谱（SIMS）与动态SIMS进行了比较，以确定9种杂质：Li，Na，K，Al，Ni，As，In，Fe的检测限和背景水平和Cu。通过测量来自六个不同液相外延（LPE）HgCdTe双层异质结（DLHJ）晶片的六个材料测试结构样本来收集统计数据。还包括动态SIMS和TOF-SIMS功能之间的比较。

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来源
《Journal of Electronic Materials》 |2007年第8期|1106-1109|共4页
作者
Steve Price; Larry Wang; Alice Wang; Arwa Ginwalla; Ian Mowat;
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作者单位

Raytheon Vision Systems 75 Coromar Drive Goleta CA 93117 USA;

Evans Analytical Group 810 Kifer Road Sunnyvale CA USA;

Evans Analytical Group 810 Kifer Road Sunnyvale CA USA;

Evans Analytical Group 810 Kifer Road Sunnyvale CA USA;

Evans Analytical Group 810 Kifer Road Sunnyvale CA USA;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类
关键词
SIMS; TOF-SIMS; HgCdTe; impurities; Na; Cu;

机译：SIMS;TOF-SIMS;HgCdTe;杂质;Na;Cu;

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1. Secondary Ion Mass Spectrometry and Time-of-Flight Secondary Ion Mass Spectrometry Study of Impurity Measurements in HgCdTe [J] . STEVE PRICE, LARRY WANG, ALICE WANG Journal of Electronic Materials . 2007,第8期

机译：HgCdTe中杂质测量的二次离子质谱和飞行时间二次离子质谱研究
2. Chemical Characterization of Latent Fingerprints by Matrix-Assisted Laser Desorption Ionization, Time-of-Flight Secondary Ion Mass Spectrometry, Mega Electron Volt Secondary Mass Spectrometry, Gas Chromatography/Mass Spectrometry, X-ray Photoelectron Spectroscopy, and Attenuated Total Reflection Fourier Transform Infrared Spectroscopic Imaging: An Intercomparison [J] . Melanie. J. Bailey, Nicholas J. Bright, Ruth S. Croxton, Analytical chemistry . 2012,第20期

机译：通过基质辅助激光解吸电离，飞行时间二次离子质谱，兆电子伏特二次质谱，气相色谱/质谱，X射线光电子能谱和衰减全反射傅立叶变换红外光谱对潜在指纹进行化学表征成像：比较
3. Time-of-flight mass spectrometric analysis of ion formation in hypervelocity impact of organic polymer microspheres: comparison with secondary ion mass spectrometry, Cf-252 mass spectrometry and laser mass spectrometry [J] . Kissel J., Krueger FR. Rapid Communications in Mass Spectrometry: RCM . 2001,第18期

机译：飞行时间质谱分析有机聚合物微球超高速撞击中的离子形成：与二次离子质谱，Cf-252质谱和激光质谱的比较
4. Time-of-Flight Secondary Ion Mass Spectrometry Application to the Study of Surface Modifications [C] . Y. De Puydt, M. Repoux, F. Delamare Surface Modification Technologies . 1998

机译：飞行时间二次离子质谱施用在表面修饰研究中
5. Characterization of novel polymers by time-of-flight secondary ion mass spectrometry, matrix-assisted laser desorption mass spectrometry, and x-ray photoelectron spectroscopy. [D] . Belu, Anna Marie. 1994

机译：通过飞行时间二次离子质谱，基质辅助激光解吸质谱和X射线光电子能谱表征新型聚合物。
6. High throughput discovery of thermo-responsive materials using water contact angle measurements and time-of-flight secondary ion mass spectrometry [O] . Andrew L Hook, David J Scurr, Daniel G Anderson, -1

机译：使用水接触角测量和飞行时间二次离子质谱法发现热响应材料的高通量
7. Chemical characterization of latent fingerprints by matrix-assisted laser desorption ionization, time-of-flight secondary ion mass spectrometry, mega electron volt secondary mass spectrometry, gas chromatography/mass spectrometry, X-ray photoelectron spectroscopy, and attenuated total reflection Fourier transform infrared spectroscopic imaging: an intercomparison [O] . Bailey, Melanie J., Bright, Nicholas J., Croxton, Ruth S., 2012

机译：潜在指纹的化学表征，包括基质辅助激光解吸电离，飞行时间二次离子质谱，兆电子伏特二次质谱，气相色谱/质谱，X射线光电子能谱和衰减全反射傅里叶变换红外光谱成像：比较
8. Development and Application of SIMS (Secondary Ion Mass Spectrometry) Characterization Techniques for the Study of Impurities and Impurity Motion in HgCdTe and CdTe [R] . Evans, C. A. 1983

机译：用于研究HgCdTe和CdTe中杂质和杂质运动的sIms（二次离子质谱）表征技术的开发与应用

Secondary Ion Mass Spectrometry and Time-of-Flight Secondary Ion Mass Spectrometry Study of Impurity Measurements in HgCdTe

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