Band gap-tuned MoS_(2(1-x))Te_(2x)thin films synthesized by a hybrid Co-sputtering and post-deposition tellurization annealing process

著录项

• 来源
  《Journal of Materials Research》 |2017年第16期|3021-3028|共8页
• 作者

  Hibino Yusuke; Ishihara Seiya; Sawamoto Naomi; Ohashi Takumi; Matsuura Kentarou; Machida Hideaki; Wakabayashi Hitoshi; Ogura Atsushi;

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• 作者单位

  School of Science and Technology, Meiji University, Kawasaki-shi, Kanagawa-ken, Japan;

  School of Science and Technology, Meiji University, Kawasaki-shi, Kanagawa-ken, Japan;

  School of Science and Technology, Meiji University, Kawasaki-shi, Kanagawa-ken, Japan;

  School of Engineering, Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, Yokohama-shi, Kanagawa-ken, Japan;

  School of Engineering, Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, Yokohama-shi, Kanagawa-ken, Japan;

  Gas-Phase Growth Ltd., Tokyo University of Agriculture and Technology, Koganei-shi, Tokyo-to, Japan;

  School of Engineering, Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, Yokohama-shi, Kanagawa-ken, Japan;

  School of Science and Technology, Meiji University, Kawasaki-shi, Kanagawa-ken, Japan;

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• 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  alloy; sputtering; X-ray photoelectron spectroscopy;

  机译：合金;溅射X射线光电子能谱;