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Characterization of nanocrystalline Ti films deposited by DC magnetron sputtering onto FTO glass substrate

机译：直流磁控溅射沉积在FTO玻璃基板上的纳米Ti膜的表征

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摘要

Titanium (Ti) thin films were deposited by DC magnetron sputtering at conventional conditions with different substrate temperature, deposition rate, and inert gas pressure. The compositional, structural, morphological, and optical properties of the Ti films were investigated. It is shown that the films were crystalline with oc-Ti phase and hep structure only. The crystallinity increased with increase in substrate and deposition rate. Analysis of the atomic force microscopy images shows that the films were uniform, crack free, and adhered well to the substrate. It is found that, a strong relation existed between the structural and optical properties of the films. The optical properties of the Ti films were most influenced under the deposition conditions. From this dependence, the optimum deposition conditions are obtained to prepare metallic, crystalline, and dense Ti films with smooth surface under conventional conditions.
机译：钛（Ti）薄膜是通过直流磁控溅射在常规条件下以不同的基板温度，沉积速率和惰性气体压力沉积的。研究了Ti膜的组成，结构，形态和光学性质。结果表明，该膜仅具有oc-Ti相和hep结构的结晶。结晶度随基材和沉积速率的增加而增加。原子力显微镜图像的分析表明，这些膜是均匀的，无裂纹的，并且与基底的粘附性很好。发现在膜的结构和光学性质之间存在强烈的关系。 Ti膜的光学性质在沉积条件下受到最大影响。根据这种依赖性，可获得最佳沉积条件，以在常规条件下制备具有光滑表面的金属，晶体和致密的Ti膜。

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  • 来源
    《Journal of Materials Research》 |2015年第20期|3093-3103|共11页
  • 作者

    Motahareh Einollahzadeh-Samadi; Reza Sabet Dariani; Mehdi Abdi;

  • 作者单位

    Department of Physics, Alzahra University, Tehran 1993893973, Iran;

    Department of Physics, Alzahra University, Tehran 1993893973, Iran;

    Physik Department, Technische Universitaet Muenchen, 85748 Garching, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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