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首页> 外文期刊>Journal of Materials Research >Determination of the energy release rate in the interfacial delamination of silicon nitride film on gallium arsenide substrate via nanoindentation
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Determination of the energy release rate in the interfacial delamination of silicon nitride film on gallium arsenide substrate via nanoindentation

机译：纳米压痕法测定砷化镓衬底上氮化硅膜界面分层中的能量释放速率

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摘要

Nanoindentation was performed to study the interfacial delamination of SiN/GaAs film/substrate structures, and to determine the adhesion properties of the interface. A sequential dual-indentation approach was developed and the tests were carefully designed to induce interfacial delamination, but avoid the occurrence of the film's through-thickness fracture or buckling. A clamped circular plate model was used to approximate the elastic deflection of the detached film and hence the delamination area. The Griffith energy balance was then used to compute the energy release associated with the delamination. The energy release rate, G_(in), calculated was found to be independent on the testing conditions, which agrees with the fundamental assumption of the Griffith energy concept.
机译：进行纳米压痕研究SiN / GaAs膜/基底结构的界面分层，并确定界面的粘合性能。开发了一种顺序双压痕方法，并精心设计了测试以引起界面分层，但避免了膜的全层破裂或屈曲的发生。使用夹紧的圆板模型来估计分离的薄膜的弹性挠度，从而估计分层面积。然后，使用格里菲斯（Griffith）能量平衡来计算与分层相关的能量释放。发现计算出的能量释放速率G_（in）与测试条件无关，这与格里菲斯能量概念的基本假设相符。

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  • 来源
    《Journal of Materials Research》 |2014年第6期|801-810|共10页
  • 作者

    Mingyuan Lu; Han Huang;

  • 作者单位

    School of Mechanical and Mining Engineering, Faculty of Engineering, Architecture and Information Technology (EAIT), The University of Queensland, Queensland 4072, Australia;

    School of Mechanical and Mining Engineering, Faculty of Engineering, Architecture and Information Technology (EAIT), The University of Queensland, Queensland 4072, Australia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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