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首页> 外文期刊>Journal of Materials Research >Structural and tribological characterization of Ti-In-N films deposited by magnetron sputter deposition
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Structural and tribological characterization of Ti-In-N films deposited by magnetron sputter deposition

机译：磁控溅射沉积Ti-In-N薄膜的结构和摩擦学表征

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摘要

TiN-indium composite films were deposited by simultaneous sputtering of titanium and indium in a mixed Argon/Nitrogen atmosphere and characterized for tribological applications. Film compositions showed a nonlinear behavior as a function of sputter gun power. For films deposited at -50 V bias, and containing less than 29 relative percent indium, the films had a face centered cubic structure, but at higher indium contents (63-82%) the structure was not consistent with either TiN or indium. At -150 V bias, the films had either the TiN structure, In-type structure, or a mixture of the two. Atomic force microscopy images showed the formation of semispherical drops on the surface of the samples deposited at -50 V bias voltage, whereas at -150 V bias voltage the samples exhibited a smooth coating surface with occasional ellipsoidal blisters. Nanoindentation test of the films shows low hardness (5-12 GPa), but tribological testing showed that frictional behavior can be improved by moderate heating before testing, suggesting indium segregation to the surface.
机译：通过在氩/氮混合气氛中同时溅射钛和铟来沉积TiN-铟复合膜，并对其进行摩擦学表征。膜组成显示出非线性行为，该行为是溅射枪功率的函数。对于在-50 V偏压下沉积且包含少于29％的相对铟的薄膜，该薄膜具有面心立方结构，但是在较高的铟含量（63-82％）下，该结构与TiN或铟均不一致。在-150 V偏压下，薄膜具有TiN结构，In型结构或两者的混合物。原子力显微镜图像显示在-50 V偏置电压下沉积的样品表面上形成了半球形液滴，而在-150 V偏置电压下，样品呈现出光滑的涂层表面，偶有椭圆形气泡。薄膜的纳米压痕测试显示硬度低（5-12 GPa），但是摩擦学测试表明，在测试前适当加热可以改善摩擦性能，表明铟偏析在表面。

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  • 来源
    《Journal of Materials Research》 |2012年第5期|p.850-856|共7页
  • 作者

    Margaret A. Nowicki; James E. Krzanowski; Jose L. Endrino;

  • 作者单位

    Department of Mechanical Engineering, University of New Hampshire, Durham, New Hampshire;

    Department of Mechanical Engineering, University of New Hampshire, Durham, New Hampshire;

    Instituto de Ciencia de Materials de Madrid (CSIC), 28049 Madrid, Spain;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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