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首页> 外文期刊>Journal of Materials Research >Effect Of Abrasive Material Properties On Polishing Rate Selectivity Of Nitrogen-doped Ge_2sb_2te_5 To Sio_2 Film In Chemical Mechanical Polishing
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Effect Of Abrasive Material Properties On Polishing Rate Selectivity Of Nitrogen-doped Ge_2sb_2te_5 To Sio_2 Film In Chemical Mechanical Polishing

机译:磨料性质对化学机械抛光中掺氮的Ge_2sb_2te_5对Sio_2薄膜抛光速率选择性的影响

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摘要

We investigated the polishing rate and selectivity of nitrogen-doped Ge_2Sb_2Te_5 (NGST) to SiO_2 film for different abrasive materials (colloidal silica, fumed silica, and ceria abrasives). They both were strongly dependant on abrasive material properties. The polishing rate of nitrogen-doped NGST decreased in the order ceria, fumed silica, and colloidal silica abrasives, which was determined by abrasive material properties, such as abrasive hardness, crystal structure, and primary and secondary abrasive sizes. In addition, the polishing rate slope of NGST film was not significantly different for different abrasive materials, indicating that the polishing of NGST film is mechanical dominant polishing. In contrast, the polishing rate slope of SiO_2 film decreased in the order ceria, fumed silica, and colloidal silica abrasives, indicating that the polishing of SiO_2 film is chemical dominant polishing. Furthermore, the difference in polishing rate slopes between NGST and SiO_2 film gave a polishing rate selectivity of NGST to SiO_2 film higher than 100:1 with colloidal silica abrasive.
机译:我们研究了不同磨料(胶态二氧化硅,气相二氧化硅和二氧化铈研磨剂)中掺氮的Ge_2Sb_2Te_5(NGST)对SiO_2膜的抛光速率和选择性。它们都强烈地依赖于磨料的性能。氮掺杂NGST的抛光速率按氧化铈,气相二氧化硅和胶态二氧化硅磨料的顺序降低,这取决于磨料的性能,例如磨料硬度,晶体结构以及一次和二次磨料的尺寸。另外,对于不同的磨料,NGST薄膜的抛光速率斜率没有显着差异,这表明NGST薄膜的抛光是机械主导抛光。相反,SiO 2膜的抛光速率斜率以二氧化铈,气相二氧化硅和胶体二氧化硅磨料的顺序减小,表明SiO 2膜的抛光是化学占主导的抛光。此外,NGST和SiO_2薄膜之间的抛光速率斜率差异使胶体二氧化硅磨料对NGST的SiO_2薄膜的抛光速率选择性高于100:1。

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