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首页> 外文期刊>Journal of Materials Research >In situ study of deformation mechanisms in sputtered free-standing nanocrystalline nickel films
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In situ study of deformation mechanisms in sputtered free-standing nanocrystalline nickel films

机译：溅射自支撑纳米晶镍薄膜的变形机理原位研究

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摘要

Nickel films of 1.5-10-(mu)m thickness, produced by dc magnetron sputtering and with disperse grain size distributions peaking in the 30-60-nm range, were subject to in situ tensile straining in a transmission electron microscope. The deformation was stopped frequently, while keeping the load applied, for transmission electron microscopy observation of the internal structure. Contrast changes occurred in many of the grains between strain increments. Ample evidence was seen of dislocation activity, which appears to be the major mechanism for deformation of the samples. Dislocations were seen in grains as small as 20 nm. Parallel arrays of roughly equally spaced dislocations were observed, spaced about 5-10-nm apart. Intergranular nanovoids were found to form and grow with accompanying strain relief in neighboring grains. The results of the current study are generally consistent with previous in situ investigations and contribute to the understanding of deformation mechanisms in free-standing thin films, which may differ somewhat from those in bulk nanocrystalline materials or in films attached to a substrate.
机译：通过直流磁控管溅射制备的厚度为1.5-10-μm的镍膜，其分散的晶粒尺寸分布在30-60nm范围内达到峰值，在透射电子显微镜中进行了原位拉伸应变。在保持施加载荷的同时，经常停止变形，以进行透射电子显微镜观察内部结构。在应变增量之间，许多晶粒中发生了对比度变化。大量证据表明位错活动，这似乎是样品变形的主要机制。在小至20 nm的晶粒中观察到位错。观察到大致等距错位的平行阵列，相距约5-10 nm。发现晶间纳米空隙形成并随着伴随的应力释放在邻近晶粒中生长。当前研究的结果通常与以前的原位研究一致，并且有助于理解独立式薄膜的变形机理，这种变形机理可能与块状纳米晶体材料或附着在基材上的薄膜中的变形机理有所不同。

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  • 来源
    《Journal of Materials Research》 |2004年第4期|p.1029-1037|共9页
  • 作者

    R. Mitra; W-A. Chiou; J. R. Weertman;

  • 作者单位

    Department of Materials Science and Engineering, Northwestern University, Evanston, Illinios 60208;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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