Cubic silicon nitride embedded in amorphous silicon dioxide

Ming Zhang; Hongliang He; F. F. Xu

首页> 外文期刊>Journal of Materials Research >Cubic silicon nitride embedded in amorphous silicon dioxide

【24h】

Cubic silicon nitride embedded in amorphous silicon dioxide

机译：嵌入无定形二氧化硅中的立方氮化硅

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

A cubic silicon nitride embedded in amorphous SiO_2 compound has been characterized by means of high-resolution analytical electron microscopy. The specimen was prepared from β-si_3N_4 powders at a high pressure and temperature by shock wave compression.

机译：嵌入在非晶态SiO_2化合物中的立方氮化硅已通过高分辨率分析电子显微镜进行了表征。由β-si_3N_4粉末在高压和高温下通过冲击波压缩制备样品。

著录项

来源
《Journal of Materials Research》 |2001年第8期|p.2179-2181|共3页
作者
Ming Zhang; Hongliang He; F. F. Xu;
展开▼
作者单位

展开▼
收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类工程材料学;
关键词

相似文献

外文文献
中文文献
专利

1. Surface Structural Comparison of Composite Film of Bacteriorhodopsin and Phosphatidylcholine Fabricated on Amorphous Silicon Dioxide, Crystal Silicon Dioxide, and Hydrogenated Amorphous Silicon [J] . Yutaka Tsujiuchi, Keigo Furuya, Jun Matsumoto, Japanese journal of applied physics . 2010,第1issue2期

机译：非晶态二氧化硅，晶体二氧化硅和氢化非晶态硅上制备的细菌视紫红质和磷脂酰胆碱复合膜的表面结构比较
2. Influence of silicon dioxide-silicon interface trap charges on the performance of monolithic metal-zinc oxide-silicon nitride-silicon dioxide-silicon convolver [J] . Panwar B.S. IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control . 2003,第1期

机译：二氧化硅-硅界面陷阱电荷对单片金属-氧化锌-氮化硅-二氧化硅-硅卷积器性能的影响
3. Structural characterization determination of silicon nanocrystals embedded in amorphous silicon nitride matrix from the effect of the light scattering [J] . Hafsi Nadjet, Bouridah Hachemi, Boutaoui Noureddine, Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic . 2019,第期

机译：在光散射效应中嵌入非晶氮化硅基质中硅纳米晶体的结构表征测定
4. High-Quality Surface Passivation Obtained by High-Rate Deposited Silicon Nitride, Silicon Dioxide and Amorphous Silicon using the Versatile Expanding Thermal Plasma Technique [C] . B. Hoex, F.J.J. Peeters, A.J.M van Erven, . 2006

机译：使用多功能膨胀热等离子体技术通过高速率沉积的氮化硅，二氧化硅和非晶硅获得高质量的表面钝化
5. A magnetic resonance investigation of trivalent silicon centers in amorphous silicon dioxide and amorphous silicon nitride. [D] . Warren, William Leo. 1990

机译：非晶态二氧化硅和非晶态氮化硅中三价硅中心的磁共振研究。
6. Effect of Thermal Annealing on the Photoluminescence of Dense Si Nanodots Embedded in Amorphous Silicon Nitride Films [O] . Qianqian Liu, Xiaoxuan Chen, Hongliang Li, 2021

机译：热退火对非晶硅氮化硅膜嵌入浓度的致密Si纳米蛋白光致发光的影响
7. HIGH-QUALITY SURFACE PASSIVATION OBTAINED BY HIGH-RATE DEPOSITED SILICON NITRIDE, SILICON DIOXIDE AND AMORPHOUS SILICON USING THE VERSATILE EXPANDING THERMAL PLASMA TECHNIQUE [O] . 2016

机译：利用多功能扩展热等离子体技术获得高质量沉积的氮化硅，二氧化硅和非晶硅获得的高质量表面钝化
8. Study of the deposition of single crystal silicon, silicon dioxide and silicon nitride on cold-substrate silicon [R] . Aisenberg, S., Chabot, R. 1969

机译：在冷基板硅上沉积单晶硅，二氧化硅和氮化硅的研究

Cubic silicon nitride embedded in amorphous silicon dioxide

摘要

著录项

相似文献

相关主题

期刊订阅