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首页> 外文期刊>The journal of physics and chemistry of solids >CHEMICAL VAPOR DEPOSITION PRECURSOR CHEMISTRY .5. THE PHOTOLYTIC LASER DEPOSITION OF ALUMINUM THIN FILMS BY CHEMICAL VAPOR DEPOSITION
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CHEMICAL VAPOR DEPOSITION PRECURSOR CHEMISTRY .5. THE PHOTOLYTIC LASER DEPOSITION OF ALUMINUM THIN FILMS BY CHEMICAL VAPOR DEPOSITION

机译：化学气相沉积前驱体化学.5。化学气相沉积对铝薄膜的光解激光沉积

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Thin films of very high purity aluminum were formed from the laser photolysis of trimethylamine alane (TMAA) using both ultraviolet (pulsed nitrogen) and visible (argon ion) laser irradiation on a variety of substrates including gold, Si(111), GaAs(110) and Teflon (PTFE). At thicknesses of up to 1 mu m, nearly linear growth rates of 377 Angstrom s(-1) and 112 Angstrom s(-1) were observed. The formation of volatile species formed during the deposition of aluminum from TMAA was investigated by quadrupole mass spectrometry (QMS) of the reactant gas stream. The highest intensity post-deposition mass fragments were observed at m/z 58, 43 and 42 amu corresponding to [NC3H8](+), [NC2H5](+) and [NC2H4](+), respectively. These species arise from the dissociation and subsequent fragmentation of the trimethylamine ligand from the starting TMAA complex. Semi-empirical quantum chemical calculations (MNDO) for TMAA provided further support that photolysis of this precursor should result in principally ligand dissociation processes since the LUMO orbital is primarily an aluminum-nitrogen antibonding interaction. The deposited materials were also characterized by X-ray emission spectroscopy (XES), scanning electron microscopy (SEM), and Laser Microprobe Mass Analysis (LAMMA) techniques. [References: 68]
机译：高纯度铝的薄膜是通过三甲基胺铝烷（TMAA）的激光光解，在包括金，Si（111），GaAs（110）在内的各种基板上使用紫外线（脉冲氮）和可见光（氩离子）激光辐照形成的）和铁氟龙（PTFE）。在高达1微米的厚度下，观察到的线性增长率分别为377埃（-1）和112埃（-1）。通过四极质谱（QMS）研究了反应气流中从TMAA沉积铝过程中形成的挥发性物质。在m / z 58、43和42 amu分别观察到最高强度的沉积后质量碎片，分别对应于[NC3H8]（+），[NC2H5]（+）和[NC2H4]（+）。这些物质来自三甲基胺配体从起始TMAA络合物的解离和随后的断裂。 TMAA的半经验量子化学计算（MNDO）提供了进一步的支持，因为LUMO轨道主要是铝氮反键相互作用，因此该前体的光解应主要导致配体解离过程。沉积的材料还通过X射线发射光谱（XES），扫描电子显微镜（SEM）和激光微探针质量分析（LAMMA）技术进行了表征。 [参考：68]

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