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Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal time step

机译:基于水平集的反光刻技术,用于使用共轭梯度和最佳时间步长进行掩模合成

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摘要

Inverse mask synthesis is achieved by minimizing a cost function on the difference between the output and desired patterns. Such a minimization problem can be solved by a level-set method where the boundary of the pattern is iteratively evolved. However, this evolution is time-consuming in practice and usually converges to a local minimum. The velocity of the boundary evolution and the size of the evolution step, also known as the descent direction and the step size in optimization theory, have a dramatic influence on the convergence properties. This paper focuses on developing a more efficient algorithm with faster convergence and improved performance such as smaller pattern error, lower mean edge placement error, wider defocus band, and higher normalized image log slope. These improvements are accomplished by employing the conjugate gradient of the cost function as the evolution velocity, and by introducing an optimal time step for each iteration of the boundary evolution. The latter is obtained from an extended Euler time range by using a line search method. The authors present simulations demonstrating the efficacy of these two improvements.
机译:通过最小化输出和期望图案之间的差异的成本函数来实现逆掩模合成。这种最小化问题可以通过一种水平集方法来解决,在该方法中,图案的边界被迭代地发展。但是,这种演变在实践中非常耗时,通常会收敛到局部最小值。边界演化的速度和演化步长的大小(在优化理论中也称为下降方向和步长的大小)对收敛特性产生巨大影响。本文致力于开发一种效率更高的算法,该算法具有更快的收敛性和改进的性能,例如较小的图案误差,较低的平均边缘放置误差,较宽的散焦范围和较高的归一化图像对数斜率。通过使用成本函数的共轭梯度作为演化速度,并为边界演化的每次迭代引入最佳时间步长,可以实现这些改进。后者是通过使用线搜索方法从扩展的Euler时间范围获得的。作者提出了仿真,证明了这两种改进的功效。

著录项

  • 来源
    《Journal of Vacuum Science & Technology》 |2013年第4期|1-13|共13页
  • 作者单位

    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China|c|;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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