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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Grayscale lithography by a polymer photomask doped with laser dye
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Grayscale lithography by a polymer photomask doped with laser dye

机译：掺杂有激光染料的聚合物光掩模的灰度光刻

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摘要

This article reports on the development of a novel grayscale photomask which operates on the basis of differential absorption of ultraviolet (UV) light in photoabsorbing material. The developed photomask is made of a patterned, moldable polymer (polydimethylsiloxane) doped with a laser dye (Coumarin 314). The doped polymer functions as photoabsorbing material. Due to the moldable nature of polydimethylsiloxane, micro- and nanostructures can be created on its surface from a complementary mold relief. By adjusting the thickness of patterns formed on the photomask, concentration of the dye in the polymer, and UV exposure dose, a multitude of unique multidimensional microstructures can be fabricated with desired geometries and dimensions. Using the developed polymer photomask with a standard UV source, three-dimensional microstructures with different heights have been formed in positive photoresist by a single UV exposure step. This method is inexpensive compared to other grayscale lithography techniques and relatively easy to implement due to its process simplicity.
机译：本文报道了一种新型的灰度光掩模的开发，该掩模基于光吸收材料中紫外线（UV）的差分吸收而工作。显影的光掩模由掺杂有激光染料（Coumarin 314）的可模制的可模制聚合物（聚二甲基硅氧烷）制成。掺杂的聚合物用作光吸收材料。由于聚二甲基硅氧烷的可模制性质，可以通过互补的模具凸版在其表面上形成微结构和纳米结构。通过调节在光掩模上形成的图案的厚度，聚合物中染料的浓度和紫外线照射剂量，可以制造具有所需几何形状和尺寸的许多独特的多维微结构。使用具有标准UV源的已开发的聚合物光掩模，通过单个UV曝光步骤已在正性光刻胶中形成了具有不同高度的三维微结构。与其他灰度光刻技术相比，该方法便宜，并且由于其工艺简单而相对容易实现。

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