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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Comparative study of size dependent four-point probe sheet resistance measurement on laser annealed ultra-shallow junctions
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Comparative study of size dependent four-point probe sheet resistance measurement on laser annealed ultra-shallow junctions

机译:基于尺寸的四点探针薄层电阻在激光退火超浅结上的测量比较研究

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摘要

In this comparative study, the authors demonstrate the relationship/correlation between macroscopic and microscopic four-point sheet resistance measurements on laser annealed ultra-shallow junctions (USJs). Microfabricated cantilever four-point probes with probe pitch ranging from 1.5 to 500 μm have been used to characterize the sheet resistance uniformity of millisecond laser annealed USJs. They verify, both experimentally and theoretically, that the probe pitch of a four-point probe can strongly affect the measured sheet resistance. Such effect arises from the sensitivity (or "spot size") of an in-line four-point probe. Their study shows the benefit of the spatial resolution of the micro four-point probe technique to characterize stitching effects resulting from the laser annealing process.
机译:在这项比较研究中,作者证明了在激光退火的超浅结(USJs)上宏观和微观四点薄层电阻测量之间的关系/相关性。探针间距在1.5至500μm之间的微细悬臂四点探针已用于表征毫秒级激光退火USJ的薄层电阻均匀性。他们在实验和理论上都证明了四点探针的探针间距会严重影响所测薄层电阻。这种影响是由串联四点探针的灵敏度(或“斑点大小”)引起的。他们的研究表明,微四点探针技术的空间分辨率可用于表征激光退火过程产生的拼接效果。

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