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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Photolithographic synthesis of high-density DNA probe arrays: Challenges and opportunities
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Photolithographic synthesis of high-density DNA probe arrays: Challenges and opportunities

机译：高密度DNA探针阵列的光刻合成：挑战与机遇

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摘要

The continual need for increased manufacturing capacity in the production of GeneChip™ DNA probe arrays, and the expanding use of these arrays into new areas of application such as molecular medicine, has stimulated the development of new chemistries and production methods with higher efficiency and resolution. For current production methods based on contact photolithography, modifications in substrate materials and photoactivated synthesis reagents have provided significant improvements in array performance and information content ( ≥ 4 ×10~6 sequences/cm~2). An alternative next-generation manufacturing process is also in development, which utilizes photoacid generating polymer films, and automated projection lithography systems. This process has the ability to fabricate arrays with 1 micron feature pitch and smaller, providing an unprecedented sequence density of 10~8/cm~2 and greater.
机译：对GeneChip™DNA探针阵列生产中不断提高的制造能力的需求，以及将这些阵列扩大应用到诸如分子医学等新的应用领域中，已经刺激了具有更高效率和分辨率的新化学方法和生产方法的发展。对于基于接触式光刻的当前生产方法，基板材料和光活化合成试剂的改性已大大改善了阵列性能和信息含量（≥4×10〜6个序列/ cm〜2）。另一种替代的下一代制造工艺也在开发中，该工艺利用了产生光酸的聚合物薄膜和自动投影光刻系统。该工艺能够制造特征间距为1微米或更小的阵列，从而提供了前所未有的10〜8 / cm〜2甚至更高的序列密度。

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