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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >High throughput defect detection with multiple parallel electron beams
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High throughput defect detection with multiple parallel electron beams

机译：多个平行电子束的高通量缺陷检测

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摘要

A new concept for high throughput defect detection with multiple parallel electron-beams is described. As many as 30 000 beams can be placed on a footprint of a in.~2, each beam having its own microcolumn and detection system without cross-talk. Based on the International Technology Roadmap for Semiconductors requirements, some high level properties of the implementation of this concept were derived. A projection lens was designed that can both focus the primary beam into a small spot and simultaneously collect 75% of the secondary electrons. Conceptual design studies were performed for three crucial components of the detector chain: the scintillator, the light optics, and the detection array. The throughput of this concept is expected to be at least a factor of 300 higher than standard electron beam based defect detection systems.
机译：描述了一种具有多个平行电子束的高通量缺陷检测的新概念。可以在2英寸的占地面积上放置多达3万个光束，每个光束都有自己的微柱和检测系统，而不会产生串扰。根据国际半导体技术路线图的要求，得出了实现此概念的一些高级属性。设计了一种投影透镜，既可以将一次光束聚焦到一个小点，又可以同时收集75％的二次电子。对检测器链的三个关键组成部分进行了概念设计研究：闪烁体，光学器件和检测阵列。与基于标准电子束的缺陷检测系统相比，该概念的吞吐量预计至少高300倍。

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