Development of Wet Chemical Processing in Nippon Sheet Glass

K. Takemura; K. Doushita; K. Yokoi

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Development of Wet Chemical Processing in Nippon Sheet Glass

机译：日本平板玻璃湿法化学处理的发展

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The liquid phase deposition (LPD) is a film coating process developed in Nippon Sheet Glass (NSG). Silica tin film can be grown by an equilibrium reaction in aqueous solution The Formation of silica film on a glass substrate as found in hexafluorosilisic acid (H_2SiF_6) solution Supersaturated with silica in 1982. The film thus obtained showed extremely smooth surface and High density while formed at near room temperature. The LPD has been applied to the process of a Manufacturing substrate glass for a liquid crystal display (LCD) since 1986.

机译：液相沉积（LPD）是在日本平板玻璃（NSG）中开发的薄膜涂覆工艺。可以通过在水溶液中进行平衡反应来生长硅锡膜。1982年，在六氟硅酸（H_2SiF_6）溶液中过饱和了二氧化硅的玻璃基板上形成了二氧化硅膜。如此制得的膜在成型时显示出极其光滑的表面和高密度在接近室温的温度下自1986年以来，LPD就已应用于制造用于液晶显示器（LCD）的基板玻璃的过程。

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来源
《Key Engineering Materials》 |1998年第1998期|p.177-184|共8页
作者
K. Takemura; K. Doushita; K. Yokoi;
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正文语种 eng
中图分类工程基础科学;
关键词
Liquid Phase Deposition (LPD); Silica Film; Alkali Diffusion Barrier;

机译：液相沉积（LPD）;硅胶膜碱扩散屏障;

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1. Nippon sheet glass development in heat-isolating glass [J] . Glass-technology international . 1999,第4期

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4. Development of wet chemical processing in nippon sheet glass [C] . K.Takemura, K.Doushita, K.Yokoi, International conference on application and commercialization of Sol-Gel processing . 1998

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7. New Developments in Chemical Wet Processes. Microfabrication Based on Self-assembled Monolayer Resists and Wet-chemical Processes. [O] . Hiroyuki SUGIMURA, Osamu TAKAI 2001

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Development of Wet Chemical Processing in Nippon Sheet Glass

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